Abstract
A series of Mn–Co–Ni–O spinel oxide films showing negative temperature coefficient were successfully deposited on alumina ceramic substrates by RF sputtering procedure. All films showed a poly-crystalline spinel structure. For an Ar:O2 ratio of 10:0, the deposited film showed the highest grow rate and a two-layer-structured Mn–Co–Ni–O spinel film was formed. The high performance of the MCN thin film is testified by a room temperature resistance of 4.16 MΩ, a B value of 5999 K and activation energy of 0.52 eV. These improvements are meaningful, especially concerning industrial applications.
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Acknowledgements
This work was supported by the Thousand Youth Talents Plan (No. Y42H831301), the Foundation of Director of Xinjiang Technical Institute of Physics & Chemistry, CAS (No. 2015RC010), the Xinjiang Program of Cultivation of Young Innovative Technical Talents (No. 2013731022), the West Light Foundation of the Chinese Academy of Sciences (Nos. XBBS-2014-04, 2015-XBQN-B-07), the National Natural Science Foundation of China (Nos. 21103225, 61504168), Science and Technology Program of Hebei Province (D2016403064, 16044601Z), Hebei outstanding young scholars and Hebei Science and Technology Support Program (15211121).
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Shi, Q., Ren, W., Kong, W. et al. High B value Mn-Co-Ni spinel films on alumina substrate by RF sputtering. J Mater Sci: Mater Electron 28, 9876–9881 (2017). https://doi.org/10.1007/s10854-017-6742-8
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DOI: https://doi.org/10.1007/s10854-017-6742-8