Abstract
In this paper, we investigate the impacts of variation in the core gate thickness and germanium content on the performance of a Si1−xGex source/drain Si-nanotube junctionless field-effect transistor. A SiGe source/drain structure is combined with a core gate inside the nanotube to address and suppress the stringent issue of short-channel effects (SCEs). The effect of gate length, bias voltages, and Ge content on the subthreshold current, threshold voltage, and SCEs has also been studied by developing a compact analytical model including the quantum confinement effect. Our results highlight the utility of core gate and Si1−xGex source/drain to provide an additional degree of freedom to control SCEs in the nanoscale regime.
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Acknowledgements
This work is an outcome of the research and development work undertaken in the project under the Visvesvaraya Ph.D. Scheme of Ministry of Electronics and Information Technology (MeitY), Government of India, being implemented by Digital India Corporation [Ref. No.: MeitY-PhD-3186].
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Thakur, A., Dhiman, R. Impacts of core gate thickness and Ge content variation on the performance of Si1−xGex source/drain Si–nanotube JLFET. J Comput Electron 20, 237–247 (2021). https://doi.org/10.1007/s10825-020-01618-y
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DOI: https://doi.org/10.1007/s10825-020-01618-y