Abstract
The Fresnel reflections occurring at the interfaces of a silicon wafer shall be drastically reduced by reactive ion beam etching of so called moth-eye structures into both surfaces of the wafer. This kind of impedance matching is advantageous to a multilayer interference system when the silicon wafer shall be used as an entrance window for high temperature thermopile infrared radiation sensors and emitters. The transmission was measured to be increased by more then 60%, compared to a polished silicon wafer.
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The authors wish to thank Dr. Albrecht Lerm, and Jürgen Müller, Institute for Physical High Technology, for their advice making these investigations.
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Glaser, T., Ihring, A., Morgenroth, W. et al. High temperature resistant antireflective moth-eye structures for infrared radiation sensors. Microsystem Technologies 11, 86–90 (2005). https://doi.org/10.1007/s00542-004-0412-5
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DOI: https://doi.org/10.1007/s00542-004-0412-5