Skip to main content
SpringerLink
Log in

Depression in the cloud point of Tween in the presence of glycol additives and triblock polymers

  • Short Communication
  • Published:
Colloid and Polymer Science Aims and scope Submit manuscript

Abstract

Cloud point (CP) measurements of Tween 20 and Tween 80 were carried out in the presence of various glycol oligomers and triblock polymers (TBP). The cloud points of both Tween 20 and 80 decrease in the presence of both types of additives. Among the glycol oligomeric additives, ethylene glycol monobutyl ether was found to reduce the CP maximum. An increase in the repeating units of polymeric glycol additives leads to a decrease in CP. Reduction in the CP in the presence of TBP depends upon the increase in hydrophobic/hydrophilic ratio among the polypropylene to polyethylene units.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3

Similar content being viewed by others

References

  1. Myers D (1992) Surfactant science and technology, 2nd edn. VCH, New York

  2. Frieberg SE, Chiu M (1988) J Disper Sci Technol 9:443

    Google Scholar 

  3. Cordero BM, Pavon JLP, Pinto CG, Laespada MEF (1993) Talanta 40:1703

    Article  Google Scholar 

  4. Saitoh T, Hinze WL (1995) Talanta 42:119

    Article  CAS  Google Scholar 

  5. Alexandridis P, Hatton TA (1995) Colloid Surface A 96:1

    Article  CAS  Google Scholar 

  6. Da Silva RC, Loh W (1998) J Colloid Interface Sci 202:385

    Article  Google Scholar 

  7. Goto A, Nihei M, Endo F (1998) J Phys Chem 84:2268

    Google Scholar 

  8. Goto A, Endo F, Higashida S (1985) Bull Chem Soc Jpn 58:773

    CAS  Google Scholar 

  9. Donbrow M, Azaz E (1976) J Colloid Interface Sci 57:20

    CAS  Google Scholar 

  10. Bakshi MS, Kaur G (2000) J Surfactants Deterg 3(2):159

    CAS  Google Scholar 

  11. Bakshi MS (2001) Tenside Surfact Det 38(2):103

    CAS  Google Scholar 

  12. Marinov G, Michels B, Zana R (1998) Langmuir 14:2639

    Article  CAS  Google Scholar 

  13. Thurn T, Couderc S, Sidhu J, Bloor DM, Penfold J, Holzwarth JF, Wynjones E (2002) Langmuir 18:9267

    Article  CAS  Google Scholar 

Download references

Acknowledgements

Financial assistance from ICU-DAF (BARC) and CSIR under a CSIR research project [Ref. No. 01(1777)/02/EMR-II] is thankfully acknowledged.

Author information

Authors and Affiliations

  1. Department of Chemistry, Guru Nanak Dev University, 143005, Amritsar, Punjab, India

    Rakesh Kumar Mahajan, Jyoti Chawla & Mandeep Singh Bakshi

Authors
  1. Rakesh Kumar Mahajan
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Jyoti Chawla
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Mandeep Singh Bakshi
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding authors

Correspondence to Rakesh Kumar Mahajan or Mandeep Singh Bakshi.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Mahajan, R.K., Chawla, J. & Bakshi, M.S. Depression in the cloud point of Tween in the presence of glycol additives and triblock polymers. Colloid Polym Sci 282, 1165–1168 (2004). https://doi.org/10.1007/s00396-004-1050-2

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00396-004-1050-2

Keywords

Search

Navigation