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A step toward next-generation nanoimprint lithography: extending productivity and applicability

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Abstract

Because of its unique principle based on mechanical deformation, nanoimprint lithography (NIL) has been playing an important role for nanopatterning and nanofabrication beyond the limit of conventional optical lithography. Many diverse fields involving electronics, photonics, and energy engineering have all shown significant increase in utilization of nanopattern structures, particularly in large areas and at submicron scales. To meet this demand, expanding the realm of NIL toward more scalable and versatile patterning technology is in high demand. In this feature article, we give an overview of how NIL can extend productivity and applicability by addressing three key issues: continuous NIL for more scalable nanopatterning, large-area mold fabrications, and novel resist engineering.

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Acknowledgments

This work was supported by the NSF grant CMMI 1025020 through the subcontract from University of Massachusetts, Amherst. JGO acknowledges the support by the Research Program funded by the Seoul National University of Science and Technology. HJP acknowledges the support by Nano Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning. (2009-0082580), and the support by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (2014R1A1A2056403). YJS acknowledges the support by Multidisciplinary University Research Initiatives (MURI) Program and Korean Pioneer Project funded by the National Research Foundation of Korea (NRF).

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Authors and Affiliations

  1. Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul, 139-743, Korea

    Jong G. Ok

  2. Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, PA, 19104, USA

    Young Jae Shin

  3. Division of Energy Systems Research, Ajou University, Suwon, 443-749, Korea

    Hui Joon Park

  4. Department of Mechanical Engineering; Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, 48109, USA

    L. Jay Guo

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  1. Jong G. Ok
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Correspondence to Jong G. Ok, Hui Joon Park or L. Jay Guo.

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Ok, J.G., Shin, Y.J., Park, H.J. et al. A step toward next-generation nanoimprint lithography: extending productivity and applicability. Appl. Phys. A 121, 343–356 (2015). https://doi.org/10.1007/s00339-015-9229-6

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