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Annealing of gold nanostructures sputtered on glass substrate

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Abstract

The effects of annealing at 300 °C on gold nanostructures sputtered onto glass substrate were studied using XRD, SAXSees, the Van der Pauw method and ellipsometry. As-sputtered and annealed samples exhibit a different dependence of the gold lattice parameter on the sputtering time. With increasing sputtering time the average thickness of the layer and the size of gold crystallites increased. Another rapid enlargement of the crystallites is observed after annealing. The volume resistivity decreases rapidly with the increasing sputtering time for both, as-deposited and annealed structures. With increasing sputtering time initially discontinuous gold coverage changes gradually in a continuous one. Electrically continuous gold coverage on the as-sputtered and annealed samples exhibits the same concentration of free charge carriers and Hall mobility. Optical constants of as-deposited and annealed gold films determined by ellipsometry support resistivity measurements and clearly manifest the presence of plasmons in discontinuous films.

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Authors and Affiliations

  1. Department of Solid State Engineering, Institute of Chemical Technology, 166 28, Prague, Czech Republic

    V. Švorčík & J. Siegel

  2. New Technologies-Research Centre in Westbohemian Region, University of West Bohemia, 306 14, Plzen, Czech Republic

    P. Šutta

  3. Department of Applied Physics and Mathematics, University of Pardubice, 532 10, Pardubice, Czech Republic

    J. Mistrík & P. Janíček

  4. Anton Paar GmbH, 8054, Graz, Austria

    P. Worsch

  5. Department of Chemistry, J.E. Purkyně University, 400 96, Usti nad Labem, Czech Republic

    Z. Kolská

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  1. V. Švorčík
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  2. J. Siegel
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Correspondence to V. Švorčík.

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Švorčík, V., Siegel, J., Šutta, P. et al. Annealing of gold nanostructures sputtered on glass substrate. Appl. Phys. A 102, 605–610 (2011). https://doi.org/10.1007/s00339-010-6167-1

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  • DOI: https://doi.org/10.1007/s00339-010-6167-1

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