Abstract
Titanium diboride (TiB2) plates (about 1 mm maximum thickness) were prepared by chemical vapour deposition (CVD) using a TiCl4, B2H6 and H2 system at deposition temperatures,T dep of 1323–1773 K. The B/Ti atomic ratio in the deposits was 2, and the composition is strictly stoichiometric. Chlorine was not detected. The measured lattice parameters werea=0.3029 nm andc=0.3229 nm. Density is in close agreement with the theoretical value (4.50 g cm−3). Preferred orientation of the CVD TiB2 plates varies mainly with total gas pressures,P tot. AtP tot=4 kPa the (1 0 0) plane and atP tot=40 kPa the (1 1 0) plane is preferably oriented parallel to the substrates. The effect ofP tot on the preferred orientation is discussed thermodynamically, and explained by supersaturation in the gas phase.
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Mukaida, M., Goto, T. & Hirai, T. Preferred orientation of TiB2 plates prepared by CVD of the TiCl4 + B2H6 system. J Mater Sci 26, 6613–6617 (1991). https://doi.org/10.1007/BF02402653
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DOI: https://doi.org/10.1007/BF02402653