Abstract
Potential energy profiles for strongly relaxed defects in SiO2 are interpreted in terms of a pseudo-Jahn-Teller effect. Defect conversion rates involving tunelling transitions betveen energy minima are calculated using a reaction-rate method. Obtained relaxation time vs. temperature dependences call for further thermal bleaching experiments.
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An invited paper for the International Symposium on Physics of Defect Centres — PDC '86 — September 22–26, 1986, Bechyně, Czechoslovakia.
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Georgiev, M., Manov, A. Relaxation of pseudo-Jahn-Teller centers in SiO2 . Czech J Phys 38, 83–96 (1988). https://doi.org/10.1007/BF01596522
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DOI: https://doi.org/10.1007/BF01596522