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Nonequilibrium modeling of low-pressure argon plasma jets; Part I: Laminar flow

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Abstract

This paper presents a modeling attempt related to low-pressure plasma spraying processes which find increasing applications for materials processing. After a review of the various models for ionization and recombination processes, a two-temperature model for argon plasmas in chemical (ionization) nonequilibrium is established using finite rate chemistry. Results of sample calculations manifest departures from kinetic as well as chemical equilibrium, demonstrating that the conventional models based on the LTE (local thermodynamic equilibrium) assumption cannot provide proper prediction for low-pressure plasma jets.

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  1. C. H. Chang

    Present address: Idaho National Engineering Laboratory, EG&G Idaho, Inc., USA

Authors and Affiliations

  1. Department of Mechanical Engineering, University of Minnesota, 55455, Minneapolis, Minnesota

    C. H. Chang & E. Pfender

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  1. C. H. Chang
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  2. E. Pfender
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Chang, C.H., Pfender, E. Nonequilibrium modeling of low-pressure argon plasma jets; Part I: Laminar flow. Plasma Chem Plasma Process 10, 473–491 (1990). https://doi.org/10.1007/BF01447204

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  • DOI: https://doi.org/10.1007/BF01447204

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