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The depth resolution of sputter profiling

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Abstract

It is shown that the bulk radiation damage accompanying sputtering events sets ultimate limits to the depth resolution attainable in sputter profiling. These limits have been reached in a few cases but most published experimental resolutions are dominated either by instrumental effects or deterioration of depth resolution caused by surface-topography changes. The radiation-damage induced mixing is called “cascade mixing”. Guidelines for selection of projectile species and energies to minimize such mixing are given and numerical estimates for attainable depth resolutions are presented. Finally, the influence of cascade mixing is assessed relative to that of recoil implantation.

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  1. Institute of Physics, University of Aarhus, DK-8000, Aarhus C, Denmark

    H. H. Andersen

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Andersen, H.H. The depth resolution of sputter profiling. Appl. Phys. 18, 131–140 (1979). https://doi.org/10.1007/BF00934407

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