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NO dissociation on rhodium

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Abstract

The desorption and dissociation of nitric oxide on a polycrystalline Rh foil were studied by means of combined temperature-programmed desorption (TPD) and static secondary ion mass spectrometry (SSIMS). The latter method was employed either under isothermal conditions or in a temperature-programmed mode (TPSSIMS). After carefully calibrating the secondary ion intensities by means of TPD, the NO dissociation kinetics were quantitatively evaluated for low NO coverages. Fitting the SSIMS data with a Polanyi-Wigner ansatz and assuming first-order kinetics, we found an activation energy,E=8±2 kJ/mol, and a preexponential,v=100.2±0.4s−1. The data were confirmed by independent isothermal SSIMS measurements at several temperatures between 80 and 330 K. The fairly unusual rate parameters are discussed in relation to similar results obtained recently from measurements on Rh single crystal surfaces.

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Authors and Affiliations

  1. Swiss Federal Laboratories for Materials Testing and Research, Überlandstrasse 129, CH-8600, Dübendorf, Switzerland

    V. Schmatloch

  2. Chimie des Surfaces et Catalyse Hétérogène, Université Libre de Bruxelles, Campus Plaine, CP 243, B-1050, Bruxelles, Belgium

    N. Kruse

  3. Laboratorium für Technische Chemie, ETHZentrum, 8092, Zurich, Switzerland

    C. Sellmer, V. Schmatloch & N. Kruse

Authors
  1. C. Sellmer
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  2. V. Schmatloch
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  3. N. Kruse
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Sellmer, C., Schmatloch, V. & Kruse, N. NO dissociation on rhodium. Catal Lett 35, 165–174 (1995). https://doi.org/10.1007/BF00807014

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  • DOI: https://doi.org/10.1007/BF00807014

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