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Temperature dynamics of the phonon film injector

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Abstract

The processes of heating and cooling of a metal film evaporated on a dielectric substrate are analyzed. The phonon propagation in the substrate is assumed to be diffusive due to static defect scattering.

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Authors and Affiliations

  1. L. D. Landau Institute for Theoretical Physics, Academy of Sciences, USSR, Moscow, USSR

    D. V. Kazakovtsev & Y. B. Levinson

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  1. D. V. Kazakovtsev
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  2. Y. B. Levinson
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Kazakovtsev, D.V., Levinson, Y.B. Temperature dynamics of the phonon film injector. J Low Temp Phys 45, 49–66 (1981). https://doi.org/10.1007/BF00661142

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  • DOI: https://doi.org/10.1007/BF00661142

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