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Phonon reflection at a cleaved sodium fluoride-helium film interface

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Abstract

High-frequency phonons (hω/k B≳10 K) have been reflected on the solid side of a sodium fluoride-helium-4 interface. The reflectivity was measured as a function of helium film thickness and it was found that most of the change occurs below a pressure of 0.1 of the SVP at ∼1.1 K, when the helium film is a few atomic layers thick. The largest change in reflectivity occurs for transverse phonons, which travel along longer paths than the specularly reflected phonons. It is suggested that the incident phonons excite surface modes which desorb some of the surface bound helium atoms.

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Author notes

  1. A. R. Long

    Present address: Cavendish Laboratory, Madingley Road, Cambridge, England

Authors and Affiliations

  1. Department of Physics, University of Nottingham, NG7 2RD, Nottingham, England

    A. R. Long, R. A. Sherlock & A. F. G. Wyatt

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  1. A. R. Long
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  2. R. A. Sherlock
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  3. A. F. G. Wyatt
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Long, A.R., Sherlock, R.A. & Wyatt, A.F.G. Phonon reflection at a cleaved sodium fluoride-helium film interface. J Low Temp Phys 15, 523–536 (1974). https://doi.org/10.1007/BF00654624

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  • DOI: https://doi.org/10.1007/BF00654624

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