Abstract
The activation energies for the thermal oxidation of metals appear to be inversely related to the band gaps, heats of formation per equivalent and the electronic conductivity of the oxides formed. An attempt is made to develop the theoretical significance of these correlations in the context of a general discussion of some fundamental aspects of the thermal and the anodic oxidation of metals.
Similar content being viewed by others
References
E. K. Rideal andO. H. Wansbrough-Jones,Proc. Roy. Soc. (London) A123 (1929) 202.
A. F. H. Ward andN. R. Bharucha,Rec. Trav. Chim. Pays-Bas 72 (1953) 735.
A. K. Vijh, “Electrochemistry of Metals and Semiconductors” (Marcel Dekker, New York, 1973).
Idem, in “Oxides and Oxide Films”, Vol. 2, edited by J. W. Diggle (Marcel Dekker, New York, 1973).
L. Young, “Anodic Oxide Films” (Academic Press, New York, 1961).
T. P. Hoar, in “Modern Aspects of Electrochemistry”, Vol. 2, edited by J. O'M. Bockris (Butterworths, London, 1959).
J. W. Diggle, T. C. Downie andC. W. Goulding,Chem. Rev. 69 (1969) 365.
F. J. Burger andL. Young, in “Progress in Dielectrics”, Vol. 5 (Heywood, London, 1962).
A. K. Vijh,J. Mater. Sci. 5 (1970) 379.
J. L. Ord andF. C. Ho,J. Electrochem. Soc. 118 (1971) 46.
A. K. Vijh,J. Mater. Sci. 8 (1973) 1669.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Vijh, A.K. Relationship between activation energies for the thermal oxidation of metals and the semiconductivity of the oxides. J Mater Sci 9, 985–988 (1974). https://doi.org/10.1007/BF00570393
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/BF00570393