Abstract
The objective of this study is to determine the ideal thickness and annealing temperature ranges for the derived 15 weight percent iron (Fe)-doped vanadium pentoxide (V2O5) nanoparticles by depositing them as thin films on a glass substrate using e-beam evaporation. The appropriateness of these films' structural, morphological, and electrical properties for the development of thin-film strain gauges is investigated. Through structural research, the nano-structured crystallite grain size of 0.1494 Å in an orthorhombic layered cubic structure was identified. The SEM images show the uniformly dispersed morphology of the deposited films. The greater adatom mobility seen as a result of surface diffusion kinetics and atomic shadowing is highlighted by the significant change in RMS surface roughness between 0.502 and 1.785 nm. Through examination of its electrical characteristics, it was discovered that when the film's thickness increased from 80 to 250 nm, the resistance decreased from 2.4 MΩ to 26.74 KΩ and ultimately to 24.38 KΩ. This decrease was further observed when the annealing temperature was raised to 500 °C. At the thickness range of 220 nm and the annealing temperature of 300 °C, the resistance also showed the lowest recorded dip of 11.75 KΩ. Therefore, it was concluded that these optimized process parameters of 220 nm and 300 °C would be appropriate for its utilization in the development of sensors, when addressing samples that contained 15 weight percent Fe: V2O5.
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Data Availability Statement
The authors confirm that data supporting the findings of this study are available within the article.
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Acknowledgements
The authors are grateful to, “Siddaganga institute of technology” Tumakuru-572103, Karnataka, India, for supporting this research work. They thank, “IISC” Bengaluru-570023, Karnataka, India, in providing laboratory facilities for characterization.
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Chand, T.R.K., Kalpana, H.M. Study on influence of thickness and annealing on electrical characteristics of iron-doped vanadium oxide (Fe:V2O5) thin films for sensor application. Eur. Phys. J. Plus 139, 233 (2024). https://doi.org/10.1140/epjp/s13360-024-05037-x
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DOI: https://doi.org/10.1140/epjp/s13360-024-05037-x