Abstract
The thiol-ene (TE) polymerization systems have gained a lot of interests from industry and researchers in the last years. A phosphorus-silicon containing flame retardant DOPO-V was synthesized in this study, and the effect of DOPO-V on the flame retardancy of thiol ene was confirmed by cone calorimetry measurement. Moreover, the thermal stability of TE/DOPO-V (FRTE) composite was investigated by the thermogravimetric method under dynamic conditions (50–600°C) in nitrogen atmosphere. Moreover, kinetic parameters were calculated by the Kissinger and Flynn-Wall-Ozawa methods. It was observed that the activation energy for the FRTE degradation was slightly higher than that of pure TE. This was attributed to the fact that DOPO-V could further react with the TE matrix to form a complex and stable phosphorus-silicon containing char layer. Thus, the flame retardancy of FRTE/DOPO-V was higher than that of pure TE. By using both methods approximately equal values of activation energy were obtained.
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ACKNOWLEDGMENTS
The authors wish to thank the National Natural Science Foundation of China (51703099), Natural Science Foundation of Zhejiang Province (LQ13E030002), Ningbo Natural Science Foundation (2019A610032) and Chongben Foundation for financial support. This work was also supported by Shanghai Key Laboratory of Multiphase Materials Chemical Engineering.
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Xu, H., Bao, X., Wu, F. et al. Effect of a Phosphorus-Silicon Containing Flame Retardant on the Activation Energy in Thermal Degradation of Thiol-ene Composites. Russ J Appl Chem 94, 1002–1008 (2021). https://doi.org/10.1134/S1070427221070193
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DOI: https://doi.org/10.1134/S1070427221070193