Abstract
The influence of the growth conditions on the surface morphology and structural properties of AlGaInSbAs solid solutions obtained on indium-arsenide substrates is discussed. The optimal parameters of the growth process (T < 873 K, G ≤ 60 K/cm, l > 80 μm) of isoperiodic AlGaInSbAs films on InAs substrates with high structural perfection BH/2 < 30″ and a surface roughness of less than 12 nm are determined. The effect of the composition of the epitaxial AlGaInSbAs films on the mismatch between the lattice periods of the InAs film and substrate is studied. It is shown that the lattice mismatch between the film and the substrate increases with an increase in gallium in the AlxGayIn1–x–ySbzAs1–z solid solution and reaches a value of Δa = 1.8 × 10–2 Å. In the case of a change in the concentration of antimony, the lattice mismatch reaches a value of Δa = 7.2 × 10–3 Å at z = 0.5 molar fraction.
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This study was performed as a part of state assignment no. 01201354240 of the Federal Research Center of the Southern Scientific Centre of the Russian Academy of Sciences, as well as with financial support of the Russian Foundation for Basic Research (grant no. 20-08-00108A).
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Translated by S. Rostovtseva
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Lunin, L.S., Lunina, M.L., Alfimova, D.L. et al. Morphology and Structural Properties of AlGaInSbAs Epitaxial Films Grown on InAs Substrates. J. Surf. Investig. 15, 441–448 (2021). https://doi.org/10.1134/S1027451021030137
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DOI: https://doi.org/10.1134/S1027451021030137