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DIELECTRIC LAYERS BCxNy: SYNTHESIS BY THE DECOMPOSITION OF VAPORS OF ORGANOBORON COMPOUNDS, COMPOSITION AND CHEMICAL STRUCTURE

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Abstract

Composition, chemical structure, and dielectric characteristics of boron carbonitride films BCxNy prepared by chemical vapor deposition upon thermal and plasma activation of the initial gas mixture are studied. The dependence of elemental composition, dielectric constant, and resistivity of the films on synthesis conditions (type of the organoboron precursor, synthesis temperature, type and content of the additional gas) are determined by Auger electron spectroscopy and X-ray photoelectron spectroscopy. The dielectric constants of prepared films vary within 3.7-6.3 and their resistivities vary within 1012-1015 Ω·cm. The stability of dielectric properties of BCxNy films during their storage in air is studied for the first time.

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Funding

This work was partially funded by RFBR and the Government of the Novosibirsk Region (project No. 20-43-540016p_a).

The optical and mechanical characteristics of the films were studied with the support of the Ministry of Science and Higher Education of the Russian Federation (project FWUZ-2021-0006).

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Authors and Affiliations

  1. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia

    V. S. Sulyaeva & M. L. Kosinova

  2. Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk, Russia

    V. G. Kesler

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  1. V. S. Sulyaeva
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Correspondence to V. S. Sulyaeva.

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Russian Text © The Author(s), 2021, published in Zhurnal Strukturnoi Khimii, 2021, Vol. 62, No. 10, pp. 1736-1753.https://doi.org/10.26902/JSC_id87084

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Sulyaeva, V.S., Kesler, V.G. & Kosinova, M.L. DIELECTRIC LAYERS BCxNy: SYNTHESIS BY THE DECOMPOSITION OF VAPORS OF ORGANOBORON COMPOUNDS, COMPOSITION AND CHEMICAL STRUCTURE. J Struct Chem 62, 1631–1647 (2021). https://doi.org/10.1134/S0022476621100188

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