Abstract
The possibility in principle of growing III–V GaAs, AlGaAs, and InAs nanowires (NWs) on a silicon substrate with a nanometer buffer layer of silicon carbide is demonstrated for the first time. The diameter of these NWs is smaller than that of similar NWs grown on a silicon substrate. In particular, the minimum diameter is less than 10 nm for InAs NWs. In addition, it was assumed on the basis of photoluminescence measurements that, when AlGaAs NWs are grown on these substrates, a complex structure is formed due to the self-organized formation of AlGaAs quantum dots with a lower content of aluminum, embedded in the NWs.
Similar content being viewed by others
References
K. Hiruma, M. Yazawa, T. Katsuyama, K. Ogawa, K. Haraguchi, and M. Koguch, J. Appl. Phys. 77, 447 (1995).
K. Hiruma, M. Yazawa, K. Haraguchi, K. Ogawa, T. Katsuyama, M. Koguchi, and H. Kakibayashi, J. Appl. Phys. 74, 3162 (1993).
G. Zheng, W. Lu, S. Jin, and C. M. Lieber, Adv. Mater. 16, 1890 (2004).
A. B. Greytak, L. J. Lauhon, M. S. Gudiksen, and C. M. Lieber, Appl. Phys. Lett. 84, 4176 (2004).
G. E. Cirlin, A. D. Bouravleuv, I. P. Soshnikov, Yu. B. Samsonenko, V. G. Dubrovskii, E. M. Arakcheeva, E. M. Tanklevskaya, and P. Werner, Nanoscale Res. Lett. 2, 360 (2010).
M. T. Bjork, B. J. Ohlsson, T. Sass, A. I. Persson, C. Thelander, M. H. Magnusson, K. Deppert, L. R. Wallenberg, and L. Samuelson, Appl. Phys. Lett. 80, 1058 (2002).
Y. Cui and C. M. Lieber, Science 291, 851 (2001).
S. Gradecak, F. Quin, Y. Li, H.-G. Park, and C. M. Lieber, Appl. Phys. Lett. 87, 173111 (2005).
E. Patolsky, G. Zheng, O. Hayden, M. Lakadamyali, X. Zhuang, and C. M. Lieber, Proc. Natl. Acad. Sci. USA 101, 14017 (2004).
R. S. Friedman, M. C. McAlpine, D. S. Ricketts, D. Ham, and C. M. Lieber, Nature 434, 1085 (2005).
Y. Huang and C. M. Lieber, Pure Appl. Chem. 76, 2051 (2004).
D. Whang, S. Jin, and C. M. Lieber, Jpn. J. Appl. Phys. 43, 4465 (2004).
V. G. Dubrovskii, G. E. Cirlin, and V. M. Ustinov, Semiconductors 43, 1539 (2009).
G. E. Cirlin, V. G. Dubrovskii, I. P. Soshnikov, N. V. Sibirev, Yu. B. Samsonenko, A. D. Bouravleuv, J. C. Harmand, and F. Glas, Phys. Status Solidi RRL 4, 112 (2009).
L. C. Chuang, M. Moewe, C. Chase, N. P. Kobayashi, and C. Chang-Hasnain, Appl. Phys. Lett. 90, 043115 (2007).
S. A. Kukushkin and A. V. Osipov, Phys. Solid State 50, 1238 (2008).
S. A. Kukushkin, A. V. Osipov, and N. A. Feoktistov, Phys. Solid State 56, 1507 (2014).
S. A. Kukushkin and A. V. Osipov, J. Phys. D: Appl. Phys. 47, 313001 (2014).
V. G. Dubrovskii, G. E. Cirlin, and V. M. Ustinov, Semiconductors 43, 1539 (2009).
G. E. Cirlin, I. V. Shtrom, R. R. Reznik, Yu. B. Samsonenko, A. I. Khrebtov, A. D. Bouravleuv, and I. P. Soshnikov, Semiconductors 50, 1421 (2016).
V. G. Dubrovskii, I. V. Shtrom, R. R. Reznik, Yu. B. Samsonenko, A. I. Khrebtov, I. P. Soshnikov, S. Rouvimov, N. Akopian, T. Kasama, and G. E. Cirlin, Cryst. Growth Des. 16, 7251 (2016).
L. Pavesi and M. Guui, J. Appl. Phys. 10, 4779 (1994).
M. Heiss, Y. Fontana, A. Gustafsson, G. Wüst, C. Magen, D. D. O’Regan, J. W. Luo, B. Ketterer, S. Conesa-Boj, A. V. Kuhlmann, J. Houel, E. Russo-Averchi, J. R. Morante, M. Cantoni, N. Marzari, J. Arbiol, A. Zunger, R. J. Warburton, and A. Fontcuberta i Morral, Nat. Mater. 5, 439 (2013).
D. Rudolph, S. Funk, M. Döblinger, S. Morkötter, S. Hertenberger, L. Schweickert, J. Becker, S. Matich, M. Bichler, D. Spirkoska, I. Zardo, J. J. Finley, G. Abstreiter, and G. Koblmüller, Nano Lett. 13, 1522 (2013).
N. Jeon, B. Loitsch, S. Morkoetter, G. Abstreiter, J. Finley, H. J. Krenner, G. Koblmueller, and L. J. Lauhon, ACS Nano 8, 8335 (2015).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © R.R. Reznik, K.P. Kotlyar, I.V. Shtrom, I.P. Soshnikov, S.A. Kukushkin, A.V. Osipov, G.E. Cirlin, 2017, published in Fizika i Tekhnika Poluprovodnikov, 2017, Vol. 51, No. 11, pp. 1525–1529.
Rights and permissions
About this article
Cite this article
Reznik, R.R., Kotlyar, K.P., Shtrom, I.V. et al. MBE growth of ultrathin III–V nanowires on a highly mismatched SiC/Si(111) substrate. Semiconductors 51, 1472–1476 (2017). https://doi.org/10.1134/S1063782617110252
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063782617110252