Abstract
In this paper, a Si/SiGe graded-channel (GC) dual-insulator (DI) double-gate (DG) junction-less (JL) FET is presented. The proposed GC-DI-DG-JL FET is studied using 2D simulations to analyse the effect of gate metal workfunction (\(\phi _m\)) variation in switching performance parameters. The increment in \(\phi _m\) fully depletes the channel under OFF-state which improves the subthreshold characteristics of the proposed device. So that the proposed structure is benefited with the significant improvement in SS, DIBL and \(I_{\mathrm{ON}}/I_{\mathrm{OFF}}\) by increasing \(\phi _m\). For an optimised value of \(\phi _m\), the GC-DI-DG-JL FET offers the SS of \(70\ {\mathrm{mV/dec}}\), \(V_t\) of \(0.83\ V\), \(I_{\mathrm{ON}}/I_{\mathrm{OFF}}\) of \(\sim 10^{12}\) and DIBL of \(45\ {\mathrm{mV/V}}\).
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Joshi, R., Joshi, T., Kumar, S. (2021). Simulation and Analysis of Graded-Channel Dual-Insulator Double-Gate Junction-Less FET. In: Singh Mer, K.K., Semwal, V.B., Bijalwan, V., Crespo, R.G. (eds) Proceedings of Integrated Intelligence Enable Networks and Computing. Algorithms for Intelligent Systems. Springer, Singapore. https://doi.org/10.1007/978-981-33-6307-6_59
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DOI: https://doi.org/10.1007/978-981-33-6307-6_59
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