Abstract
Tantalum (Ta) and titanium (Ti) metal targets were sputtered to deposit (Ta2O5)0.965—(TiO2)0.035 composite thin films onto the quartz and P/boron–silicon (1 0 0) substrates by direct current (DC) magnetron sputtering in the oxygen environment at room temperature (RT). The as-deposited films were followed by the annealing in the temperature range from 500 to 800 °C for 90 min. X-ray diffraction results indicated the formation of Ta2O5 structure of annealed thin films. Optical measurements were performed by UV-Vis spectrophotometer, and obtained transmittance versus wavelength plot was used to determine the refractive index (n), extinction coefficient (k), and optical energy band gap (Eg) of the film material. The optical parameters derived from transmittance (T) measurement were observed varying with annealing temperature. The refractive index of prepared (Ta2O5)0.965—(TiO2)0.035 thin films, at 550 nm, was observed decreasing from 2.21 to 2.14, and Eg from 4.27 to 3.88 eV, with increasing annealing temperature. The extinction coefficient associated with the absorbance was observed decreasing with the increasing wavelength.
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Acknowledgements
Authors are very thankful to Hemvati Nandan Bahuguna Garhwal University, Srinagar Garhwal, Uttarakhand, to facilitate such an advanced research laboratory in the Department of Instrumentation Engineering-USIC, where sample preparation and characterizations have been carried out. We convey our special thanks to Indian Institute of Science, Bangalore, for providing the facility of X-ray photoelectron spectroscopy and UV-Vis spectrophotometer.
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The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.
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Thapliyal, P., Kandari, A.S., Lingwal, V., Panwar, N.S., Mohan Rao, G. (2021). Annealing Temperature-Dependent Optical Properties of (Ta2O5)0.965—(TiO2)0.035 Thin Films. In: Singh Mer, K.K., Semwal, V.B., Bijalwan, V., Crespo, R.G. (eds) Proceedings of Integrated Intelligence Enable Networks and Computing. Algorithms for Intelligent Systems. Springer, Singapore. https://doi.org/10.1007/978-981-33-6307-6_57
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