Abstract
The creation of a uniform deposition requires a thorough study and understanding of the different characteristics of plasma discharge. In this work, we are interested in modeling a radiofrequency (RF) plasma discharge using silicon nitride gases SiH4/NH3/H2. The plasma equations are solved using the numerical finite element method until a periodic steady state is obtained. The numerical results show the fundamental characteristics of RF plasma between the two reactor electrodes. These characteristics allow us to describe the physics of plasma discharge so that physico-chemical processes can be implemented for more efficient and less costly deposition.
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Grari, M., Zoheir, C. (2021). Numerical Characteristics of Silicon Nitride SiH4/NH3/H2 Plasma Discharge for Thin Film Solar Cell Deposition. In: Hajji, B., Mellit, A., Marco Tina, G., Rabhi, A., Launay, J., Naimi, S. (eds) Proceedings of the 2nd International Conference on Electronic Engineering and Renewable Energy Systems. ICEERE 2020. Lecture Notes in Electrical Engineering, vol 681. Springer, Singapore. https://doi.org/10.1007/978-981-15-6259-4_22
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DOI: https://doi.org/10.1007/978-981-15-6259-4_22
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