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Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride

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Abstract

Atomically thin h-BN is a 2D layered material consisting of sp2-hybridized alternating B and N atoms, which are covalently bonded in a honeycomb lattice crystal structure as depicted in Fig. 2.1. The planar layers are bound by relatively weak vdW forces. It has an atomically smooth surface (RMS roughness of ~0.1 nm) which is almost free from dangling bonds Dean et al. (Nat Nanotechnol 5(10):722–726, 2010) [1]. The lattice constant of h-BN is 2.504 Å and the interlayer distance is 0.333 nm. Besides being stable in the form of mono- to few-layer, many interesting and outstanding properties arise from this configuration.

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  1. School of Electrical and Electronic Engineering, Nanyang Technological University, Block S2.1, 50 Nanyang Avenue, Singapore 639798, Singapore

    Roland Yingjie Tay

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Tay, R.Y. (2018). Literature Review. In: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride. Springer Theses. Springer, Singapore. https://doi.org/10.1007/978-981-10-8809-4_2

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