Abstract
This paper provides a new algorithm for the recalculation of a polygonal geometry representation after the computation of etching and deposition simulations based on a cellular geometry representation. The purpose of that algorithm is to avoid totally any discretization errors in those parts of the geometry which were not affected by the surface movements resulting from the simulation.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
E. Strasser, G. Schrom, K. Wimmer, and S. Selberherr, ”Accurate Simulation of Pattern Transfer Processes Using Minkowski Operations”, IEICE Trans. Electronics, vol. E77-C, pp. 92–97, 1994.
W.E. Lorenson and H.E. Cline, ”Marching Cubes: A High Resolution 3D Surface Construction Algorithm”, Computer Graphics, vol. 21, pp. 163–169, 1987.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1995 Springer-Verlag Wien
About this paper
Cite this paper
Mlekus, R., Ledl, C., Strasser, E., Selberherr, S. (1995). Polygonal Geometry Reconstruction after Cellular Etching or Deposition Simulation. In: Ryssel, H., Pichler, P. (eds) Simulation of Semiconductor Devices and Processes. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6619-2_11
Download citation
DOI: https://doi.org/10.1007/978-3-7091-6619-2_11
Publisher Name: Springer, Vienna
Print ISBN: 978-3-7091-7363-3
Online ISBN: 978-3-7091-6619-2
eBook Packages: Springer Book Archive