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Deposition, Milling, and Etching with a Focused Helium Ion Beam

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Nanofabrication

Abstract

The recent successful development of the helium ion microscope has produced both a new type of microscopy and a new tool for nanoscale manufacturing. This chapter reviews the first explorations in this new field in nanofabrication. The studies that utilize the Orion helium ion microscope to grow or remove material are described, concentrating on helium ion beam deposition, milling, and etching. Helium ion beam induced deposition combines the advantage of electron beam deposition, namely high spatial resolution, with that of heavy-ion beam induced deposition, namely high efficiency. Helium milling is much slower than gallium milling, but ideal for structuring thin slabs of material with high precision. A handful of studies has demonstrated the possibility of helium ion beam etching. Experimental and theoretical studies suggest that secondary electron emission is the dominant mechanism in helium ion beam induced processing.

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Notes

  1. 1.

    The data points were divided by the average Pt content; hence, the corrected data points scatter around the original ones.

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Acknowledgements

This research is part of NanoNed, a national research program on nanotechnology, funded by the Dutch ministry of Economic Affairs in the Netherlands. Our colleagues P. Chen, E. van der Drift, H. Salemink from Delft University of Technology and D. Maas from TNO are gratefully acknowledged for their contributions and discussions. The authors acknowledge L. Scipioni, S. Boden, R. Hill, R. Livengood, S. Tan, I. Utke, C. Sanford, M. Rudneva, and F. Tichelaar for giving permission to use their figures.

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Authors and Affiliations

  1. Kavli Institute of Nanoscience, Delft University of Technology, Delft, The Netherlands

    P. F. A. Alkemade

  2. TNO Science and Industry, Delft, The Netherlands

    E. van Veldhoven

Authors
  1. P. F. A. Alkemade
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  2. E. van Veldhoven
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Corresponding author

Correspondence to P. F. A. Alkemade .

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Editors and Affiliations

  1. , National Research Council of Canada, National Institute for Nanotechnology, Saskatchewan Drive 1142, Edmonton, T6G 2M9, Alberta, Canada

    Maria Stepanova

  2. , Electrical and Computer Engineering, University of Alberta, Edmonton, T6G 2V4, Alberta, Canada

    Steven Dew

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Alkemade, P.F.A., van Veldhoven, E. (2012). Deposition, Milling, and Etching with a Focused Helium Ion Beam. In: Stepanova, M., Dew, S. (eds) Nanofabrication. Springer, Vienna. https://doi.org/10.1007/978-3-7091-0424-8_11

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