Abstract
Resistors may consist of semiconducting stripes of one type conductivity with contact pads on both ends, monolithically integrated in a semiconductor substrate of the opposite type conductivity. Masks of patterned silicon nitride layers are used to produce resistors by selective diffusion or ion implantation.
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© 1991 Springer-Verlag Berlin Heidelberg
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Krimmel, E.F., Hezel, R., Nohl, U., Bohrer, R. (1991). Silicon Nitride in Resistor Fabrication. In: Pebler, A., Schröder, F. (eds) Si Silicon. Si. Silicium. Silicon (System-Nr. 15), vol S-i / B / 1-5 / 5 / c. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-09901-8_10
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