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Nanoimprint Lithography

  • Reference work entry
Springer Handbook of Nanotechnology

Part of the book series: Springer Handbooks ((SHB))

Abstract

Nanoimprint lithography is an emerging nanopatterning method, combining nanometer-scale resolution and high throughput. In a top-down approach, a rigid stamp with a surface relief is pressed into a thin film of soft material on a hard substrate. The film is hardened before the stamp is retrieved, and the surface relief is copied into the thin film. A pattern with nano- to micrometer scale features can be replicated in a parallel process, and the stamp may be reused many times. This makes nanoimprint lithography a promising technique for volume manufacturing of nanostructured components. At present, structures with feature sizes down to 5 nm have been realized, and the resolution is limited by the ability to manufacture the stamp relief. For historical reasons, the term nanoimprint lithography (NIL) refers to a hot embossing process, where a thin film of thermoplastic material is softened by heating it, and the embossed film is hardened again when it is cooled down. In ultraviolet (UV)-NIL, a photo-polymerizable resin is used together with a UV-transparent stamp. The resin is liquid at room temperature, allowing easy embossing of the stamp, before the resin is hardened by UV exposure. In this chapter we will give an overview of nanoimprint lithography, with emphasis on NIL. Material aspects of stamps and resists are discussed. Thin-film rheology plays a central role of the understanding of the nanoimprint process, since the resist is patterned by mechanical deformation. We discuss specific applications where imprint methods have significant advantages over other structuring methods. We conclude by discussing the areas where further development in this field is required.

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Abbreviations

AFM:

atomic force microscopy

CD:

compact disc

CD:

critical dimension

CMOS:

complementary metal oxide semiconductor

CVD:

chemical vapor deposition

DNA:

deoxyribonucleic acid

DVD:

digital versatile disk

HDD:

hard disk drive

HF:

hydrofluoric acid

LFM:

lateral force microscopy

MEMS:

microelectromechanical system

MFM:

magnetic force microscopy

PC:

polycarbonate

PDMS:

polydimethylsiloxane

PMMA:

polymethylmethacrylate

PS:

polystyrene

PTFE:

polytetrafluoroethylene

RIE:

reactive ion etching

SEM:

scanning electron microscopy

SFIL:

step-and-flash imprint lithography

TMR:

track misregistration

TV:

television

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Authors and Affiliations

  1. Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, 5232, Villigen PSI, Switzerland

    Helmut Schift Dr.

  2. MIC - Department of Micro and Nanotechnology, Technical University of Denmark (DTU), Building 345 East, 2800, Kgs. Lyngby, Denmark

    Anders Kristensen Prof.

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  1. Helmut Schift Dr.
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  1. Nanotribology Laboratory for Information Storage and MEMS/NEMS (NLIM), Ohio State University, 201 W. 19th Avenue, W 390 Scott Laboratory, Ohio 43210-1142, Columbus, OH, USA

    Bharat Bhushan Prof.

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Schift, H., Kristensen, A. (2007). Nanoimprint Lithography. In: Bhushan, B. (eds) Springer Handbook of Nanotechnology. Springer Handbooks. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-29857-1_8

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