Abstract
The cost-effective design of electronic microstructures requires an advanced modeling and coupled simulation of various physical effects. The classical isothermal approach leads to the basic drift-diffusion model for semiconductor device simulation. In the stationary case, it represents a coupled nonlinear system consisting of a Poisson equation for the electric potential and two continuity equations for the electron and hole flow. We discuss various discretization schemes with special emphasis on mixed finite element methods and we further address efficient numerical solution techniques including adaptive multilevel methods. Finally, to allow for ambient conditions such as external magnetic fields we consider consistent extensions of the classical model and discuss perspectives for their numerical treatment.
The first and third author were supported by FORTWIHR, Bavarian Consortium for High Performance Scientific Computing.
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© 1995 Friedr. Vieweg & Sohn Verlagsgesellschaft mbH, Braunschweig/Wiesbaden
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Hiptmair, R., Hoppe, R.H.W., Wohlmuth, B. (1995). Coupling Problems in Microelectronic Device Simulation. In: Hackbusch, W., Wittum, G. (eds) Numerical Treatment of Coupled Systems. Notes on Numerical Fluid Mechanics (NNFM), vol 51. Vieweg+Teubner Verlag. https://doi.org/10.1007/978-3-322-86859-6_8
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DOI: https://doi.org/10.1007/978-3-322-86859-6_8
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