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In Situ High-Temperature X-ray Diffraction of Thin Films: Chemical Expansion and Kinetics

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Electro-Chemo-Mechanics of Solids

Part of the book series: Electronic Materials: Science & Technology ((EMST))

Abstract

This chapter reviews the use of in-situ X-ray diffraction analyses for exploring the chemical expansion produced by oxygen stoichiometry changes in thin oxide films during oxidation and reduction, as well as the kinetics of oxygen exchange at the surface of the films. This technique has demonstated to serve as a non-invasive and very selective complementary tool for fundamental studies on mixed ionic-electronic conducting materials.

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Notes

  1. 1.

    The assumption that oxygen defects concentration profile is homogenous in the whole film thickness is not entirely true. In some cases the XRD peaks show a slight broadening after film oxidation, compared to a narrower peak attained after lower pO2 conditions. This is an indication that the film may develop a chemical expansion profile across the thickness depending on the strain imposed by the substrate mismatch.

  2. 2.

    In this heterostructure the GDC interlayer only acts as a barrier to prevent the chemical reaction between LSCF cathode and YSZ electrolyte.

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Acknowledgements

Part of the work in this chapter has been funded by Spanish Ministry of Education through MAT2011-29081-C02-01 project.

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Authors and Affiliations

  1. Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and the Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193, Barcelona, Spain

    Jose Santiso & Roberto Moreno

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  1. Jose Santiso
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  2. Roberto Moreno
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Correspondence to Jose Santiso .

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Editors and Affiliations

  1. Massachesetts Institute of Technology, Cambridge, Massachusetts, USA

    Sean R. Bishop

  2. Kyushu University, Kyushu, Japan

    Nicola H. Perry

  3. Massachusetts Institute of Technology, Cambridge, Massachusetts, USA

    Dario Marrocchelli

  4. Brown University, Providence, USA

    Brian W. Sheldon

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Santiso, J., Moreno, R. (2017). In Situ High-Temperature X-ray Diffraction of Thin Films: Chemical Expansion and Kinetics. In: Bishop, S., Perry, N., Marrocchelli, D., Sheldon, B. (eds) Electro-Chemo-Mechanics of Solids. Electronic Materials: Science & Technology. Springer, Cham. https://doi.org/10.1007/978-3-319-51407-9_3

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