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References
General References
Lyman CE, Newbury DE, Goldstein JI, Williams DB, Romig AD Jr., Armstrong JT, Echlin PE, Fiori CE, Joy D, Lifshin E, Peters KR (1990) Scanning Electron Microscopy, X-Ray Microanalysis and Analytical Electron Microscopy; A Laboratory Workbook. Plenum Press, New York
Williams DB, Goldstein JI (1991) Quantitative X-ray Microanalysis in the Analytical Electron Microscope. In: Heinrich KFJ, Newbury DE (eds) Electron Probe Quantification. Plenum Press, New York., pp 371–398
Zemyan SM, Williams DB (1995) Characterizing an Energy-Dispersive Spectrometer on an Analytical Electron Microscope. In: Williams DB, Goldstein JI, Newbury DE (eds) X-Ray Spectrometry in Electron Beam Instruments. Plenum Press, New York., pp 203–219
Specific References
Alber U, Müllejans H, Rühle M (1997) Improved Quantification of Grain Boundary Segregation by EDS. Ultramicroscopy 69:105–116
Bennett JC, Egerton RF (1995) NiO test specimen for analytical electron microscopy: round-robin results. J Microsc Soc Am 1:143–149 (Following up on using NiOx in the journal now known as Microscopy & Microanalysis)
Van Cappellan E, Schmitz A (1992) A Simple Spot-size Versus Pixel-size Criterion for X-ray Microanalysis of Thin Foils. Ultramicroscopy 41:193–199
Cliff G, Lorimer GW (1975) The Quantitative Analysis of Thin Specimens. J Microsc 103:203–207 (Historical classic)
Egerton RF, Cheng SC (1994) The use of NiO test specimens in analytical electron microscopy. Ultramicroscopy 55:43–54 (All about using NiOx)
Lovejoy TC, Ramasse QM, Falke M, Kaeppel A, Terborg R, Zan R, Dellby N, Krivanek O (2012) Single atom identification by energy dispersive X -ray spectroscopy. Appl Phys Lett 100:154101-1-4
Newbury DE, Ritchie NWM (2015) Performing elemental microanalysis with high accuracy and high precision by scanning electron microscopy/silicon drift detector energy-dispersive X-ray spectrometry (SEM/SDD-EDS. J Mater Sci 50(2):493–518 (A very useful review)
Rose A (1970) Quantum limitations to vision at low light levels. Image Technol 12:13–15 (See also pp. 30–31)
Watanabe M, Williams DB (1999) Atomic-Level Detection by X-ray Microanalysis in the Analytical Electron Microscope. Ultramicroscopy 78:89–101
Watanabe M, Williams DB (2003) Quantification of Elemental Segregation to Lath and Grain Boundaries in Low-alloy Steel by STEM X -ray Mapping Combined with the ζ-factor Method. Z Metallk 94:307–316 (We think that this and the 2006 paper are worth reading!)
Watanabe M, Williams DB (2006) The Quantitative Analysis of Thin Specimens: a Review of Progress from the Cliff-Lorimer to the New ζ-Factor Methods. J Microsc 221:89–109 (As in the 2003 paper, you’ll find more details and references to the original work.)
We include more references than usual because this is such a new field. We’ll add other references to the website.
References for Software
(http://www.cstl.nist.gov/div837/837.02/epq/dtsa2/index.html).
Brundle D, Uritsky Y, Chernoff D (1996) Real-time simulation for X-ray microanalysis. Solid State Technology 39(3):105–111 (Electron Flight Simulator is commercialized at http://www.small-world.net/efs.htm)
Find a standardized description of the EMSA format through the International Organization for Standardization (ISO 22029:2003). ISO 22029-2003 2003 is the Standard file format for spectral data exchange. Also available at ANSI (American National Standard Institute) web site (www.ansi.org).
Find SheepShaver at http://sheepshaver.cebix.net/
Fiori CE, Swyt CR, Myklebust RL (1992) NIST/NIH Desk Top Spectrum Analyzer. Public domain software available from the National Institute of Standards and Technology, Gaithersburg, MD. http://www.cstl.nist.gov/div837/Division/outputs/DTSA/DTSA.htm
Ritchie NWM (2008) DTSA-II. Public domain software available from the National Institute of Standards and Technology, Gaithersburg, MD
Watanabe has developed a simple software package as a set of plug-ins for Gatan DigitalMicrograph. This plug-in package is freely available through his home page (http://www.lehigh.edu/~maw3/msh/xutilmain.html ). You can find the installation procedure and usage details in the help file, which comes with the plugin package.
Watanabe has summarized how to install DTSA in Windows on his web site (http://www.lehigh.edu/~maw3/msh/dtsaonwintop.html ).
17.1 – XEDS Detector Characterization
Fiori CE, Swyt CR, Ellis JR (1982) The Theoretical Characteristic to Continuum Ratio in Energy Dispersive Analysis in the Analytical Electron Microscope. In: Microbeam Analysis-1982. Ed. Heinrich KFJ, San Francisco Press, San Francisco, CA., pp 57–71
Heinrich KFJ (1987) Mass absorption coefficients for electron probe microanalysis. In: Brown JD, Packwod RH (eds) Proc 11th Int Cong on X-Ray Optics Microanalysis. University of Western Ontario, London., pp 67–377
Hovington P, L’Espérance G, Baril E, Rigaud M (1993) A standard procedure for the modeling of the decrease in detection efficiency with time for low-energy EDS spectra. Microsc Microanal 2:277–288
17.2 – X-ray Spectrum Simulation (see also References for Software above)
Fiori CE, Swyt CR (1989) The use of theoretically generated spectra to estimate detectability limits and concentration variance in energy-dispersive X-ray microanalysis. In: Russell PE (ed) Microbeam Analysis-1989. San Francisco Press, San Francisco, CA.
Newbury DE, Myklebust RL, Swyt CR (1995) The use of simulated standards in quantitative electron probe microanalysis with energy-dispersive X-ray spectrometry. Microbeam Analysis 4:221–238
17.3 – ζ-factor Method
Armigliato A (1992) X-ray Microanalysis in the Analytical Electron Microscope. In: Merli PG, Antisari MV (eds) Electron Microscopy in Materials Science. World Scientific, Singapore, pp 431–456
Gorzkowski EP, Watanabe M, Scotch AM, Chan HM, Harmer MP (2004) Direct Measurement of Oxygen in Lead-Based Ceramics Using the ζ-factor Method in an Analytical Electron Microscope. J Mater Sci 39:6735–6741
Lyman CE, Goldstein JI, Williams DB, Ackland DW, von Harrach HS, Nicholls AW, Statham PJ (1994) High Performance X-ray Detection in a New Analytical Electron Microscopy. J Microsc 176:85–98
Romig AD Jr., Goldstein JI (1979) Detectability Limit and Spatial Resolution in STEM X -ray Analysis: Application to Fe-Ni. In: Newbury DE (ed) Microbeam Analysis – 1979. San Francisco Press, San Francisco, CA., pp 124–128 (The criterion for the minimum detectable peak-intensity in an X-ray spectrum)
Watanabe M, Wade CA (2013) Practical Measurement of X-ray Detection Performance of a Large Solid-Angle Silicon Drift Detector in an Aberration-Corrected STEM. Microsc Microanal 19(Suppl. 2):1264–1265
17.4 – New Detector Configurations
Erni R, Rossel MD, Kisielowski C, Dahmen U (2009) Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Phys Rev Lett 102:096101 ((4 pages).)
von Harrach HS, Dona P, Freitag B, Soltau H, Niculae A, Rohde M (2009) An Integrated Silicon Drift Detector System for FEI Schottky Field Emission Transmission Electron Microscopes. Microsc Microanal 15(Suppl. 2):208–209 (The FEI approach)
Kotula PG, Michael JR, Rohde M (2009) Results from Two Four-Channel Si-drift Detectors on an SEM: Conventional and Annular Geometries. Microsc Microanal 15(Suppl. 2):116–117
Ohnishi I, Okunishi E, Yamazaki K, Aota N, Miyatake K, Nakanishi M, Ohkura Y, Kondo Y, Yasunaga K, Toh S, Matsumura S (2011) Development of a Large Solid Angle SDD for TEM and its Applications. Microsc Microanal 17(Suppl. 2):Late Breaking 22 (The JEOL approach)
Sawada H, Tanishiro Y, Ohashi N, Tomita T, Hosokawa F, Kaneyama T, Kondo Y, Takayanagi K (2009) STEM Imaging of 47-pm-Separated Atomic Columns by a Spherical Aberration-Corrected Electron Microscope with a 300-kV Cold Field Emission Gun. J Electron Microsc 58:357–361
Watanabe M (2011) Chapter 7: X-ray Energy Dispersive Spectrometry in Scanning Transmission Electron Microscopes. In: Pennycook SJ, Nellist PD (eds) Scanning Transmission Electron Microscopy: Imaging and Analysis. Springer, New York., pp 291–351
Zaluzec NJ (2009) Innovative Instrumentation for Analysis of Nanoparticles: The π Steradian Detector. Microscopy Today 17(4):56–59
17.4 – XEDS Tomography
Möbus G, Doole RC, Inkson BJ (2003) Spectroscopic electron tomography. Ultramicroscopy 96:433–451
Yaguchi T, Konno M, Kamino T, Watanabe M (2008) Observation of Three-dimensional Elemental Distributions of a Si-device Using a 360-degree-tilt FIB and the Cold Field-emission STEM System. Ultramicroscopy 108:1603–1615 (The Hitachi approach)
Zaluzec NJ (2012) The Confluence of Aberration Correction, Spectroscopy and Multi-Dimensional Data Acquisition. Proc. European Microscopy Congress
17.4 – Atomic Resolution X-ray Analysis
Watanabe M (2013) Microscopy Hacks: Development of Various Techniques to Assist Quantitative Nanoanalysis and Advanced Electron Microscopy. Microscopy 62(2):217–241
17. Appendix 2 – Calculation of Specimen Density
Okamoto H, Chakrabarti DJ, Laughlin DE, Massalski T (1987) The Au-Cu (Gold-Copper) System. Bull Alloy Phase Diagrams 8:454–473
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Appendix
Appendix
17.1.1 People
Chuck Fiori (1938–September 15, 1992). The DeskTop Spectrum Analyzer (DTSA) software package was originally developed by the late Chuck Fiori with Bob Myklebust and Carol Swyt. They worked at the National Institutes of Standards and Technology (NIST) and the National Institutes of Health (NIH) in late 1980s.
Joseph (Joe) I. Goldstein was born in Syracuse, NY, on January 6, 1939 and died on June 27, 2015; he founded the Lehigh short course, inspired a generation using AEM, and recruited a young DBW to join him.
17.1.2 Questions
- Q17.1:
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Compare and contrast the k-factor and the ζ-factor approaches to quantification.
- Q17.2:
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What is the single most important variable that affects your decision to use either of these two approaches? Explain why you chose that variable.
- Q17.3:
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Why should you simulate the spectra that you hope will be generated from your specimen before proceeding to gather them experimentally?
- Q17.4:
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What can you do to minimize ice and carbon contamination on your XEDS detector
- Q17.5:
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Why has it proven so difficult to detect single atoms in thin foils using XEDS while EELS has been able to do this for many years?
- Q17.6:
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Distinguish the several different definitions we use for analytical sensitivity.
- Q17.7:
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Why does a single column of atoms in a thin foil not give rise to an XEDS spectrum containing the signal from these atoms alone?
- Q17.8:
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What does your answer to question 17.5 lead you to conclude about the real spatial resolution of analysis by XEDS?
- Q17.9:
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Why are there so many characteristics of your XEDS detector that you have to determine prior to XEDS analysis when, by comparison, an EEL spectrometer is relatively free of such requirements?
- Q17.10:
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If you have a single atom of element B in an analyzed volume containing 100 atoms of element A, can you estimate, to a first approximation, how long you need to gather a spectrum in order to say with 99 % confidence that that atom of A is present. Choose a reasonable set of experimental variables (including kV, beam current probe size, detector collection angle etc.). State any further assumptions.
- Q17.11:
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Simulate X-ray spectra to confirm the conditions (the beam current, specimen thickness, acquisition time and accelerating voltage) for 1.0 wt% and 0.3 wt% detection levels of a high Z element in a relatively low Z material, e.g., Cu in Al.
- Q17.12:
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Similar to the above question; simulate X-ray spectra to confirm the conditions for 1.0 wt% and 0.3 wt% detection levels of a low Z element in a relatively high Z material, e.g., P in Ga.
- Q17.13:
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Questions 17.11 and 17.12 are for estimation of minimum mass fraction (MMF). Based on your estimated conditions in the above question, how many solute atoms are included. The number of solute atoms is equivalent to the minimum detectable mass (MDM).
- Q17.14:
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Plot the absorption loss curves of major X-ray lines in your materials systems using Eq. 17.27 and estimate the critical specimen thickness below 10 % absorption.
- Q17.15:
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Using Eq. 17.28, estimate spatial resolution values for your specimen in conventional and aberration-corrected AEMs, and plotted as a function of the specimen thickness. This plot is essentially same as Fig. 36.5c in W&C. Using this plot, determine the required specimen thickness especially for the aberration-corrected AEM.
17.1.3 Appendix 1. Error Analysis in the ζ-factor Method
As described in Sect. 17.3.3, we need an iterative calculation for determination of compositions and specimen thickness including the absorption correction in the ζ-factor method. It is not very straightforward to estimate errors in such an iterative process but there is an alternative approach for the error calculation. In an n component system, we determine compositions and thickness from n characteristic X-ray intensities via n ζ factors in the ζ-factor method. Obviously, both the n X-ray intensities and n ζ factors are independent variables, and their errors need to be taken into account if you want to determine the error estimation independently. Let’s denote the errors in X-ray intensity and the ζ factor for the jth component as ∆I j and ∆ζ j , respectively.
First, we determine the error-free composition(s) C i and thickness t from n intensities and n ζ factors without their errors. Then, we calculate the compositions and thickness with an error contribution of jth X-ray intensity by substituting I j + ∆I j for I j . The composition and thickness with the error of jth intensity are expressed as C i (∆I j ) and t(∆I j ), respectively. You have to repeat this process for all X-ray intensities independently. Similarly, the errors in each individual ζ-factor are incorporated by substituting ζ j + ∆ζ j for ζ j , and composition and thickness with errors of the z-factor are expressed as C i(∆ζ j ) and t(∆ζ j ), respectively. Finally, the errors in the compositions and thickness are given as:
(17.35)
This approach requires 2n times extra calculations of compositions and thickness after determination of the error-free values (yes, it is a bit complicated and tedious!). However, we can easily adapt this approach to computational codes and it is applicable to any iterative calculation (e.g., the matrix correction procedures for bulk-sample analysis in an EPMA such as ZAF and ϕ(ρz)). The full error analysis procedures for the ζ-factor determination and estimation can be found in the paper by Watanabe and Williams (2006).
17.1.4 Appendix 2. Calculation of the Specimen Density
In the ζ-factor method, we first determine the specimen thickness as the mass thickness ρt as we described above. To convert the mass thickness to the absolute specimen thickness, we need values of the specimen density at individual analysis points. The specimen density can be estimated from Eq. 35.27 in W&C, i.e., the mass divided by the unit-cell volume. So we need some crystallographic information to determine the unit-cell volume. Otherwise, the density can be calculated as a first approximation by taking a weighted mean (ρ = ΣC j ρ j ) or a harmonic mean (1/ρ = ΣC i /ρ j ) from the density values of the individual component elements.
For example, Fig. 17.38 shows the composition dependence of the specimen density in the Au-Cu system. All the symbols in this figure represent the densities calculated from reported lattice parameters using Eq. 35.27 in W&C. The dashed and solid lines indicate the estimated values from the simple weighted mean and the harmonic mean, respectively. The ρ values estimated by the harmonic mean describe the density very well. In fact, the harmonic-mean approach may work especially well for close-packed condensed systems, such as metallic alloys and intermetallic compounds . For other materials systems such as ceramics and glasses (even not crystalline), the density value needs to be estimated differently.
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Watanabe, M. (2016). Practical Aspects and Advanced Applications of XEDS. In: Carter, C., Williams, D. (eds) Transmission Electron Microscopy. Springer, Cham. https://doi.org/10.1007/978-3-319-26651-0_17
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