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Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes

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TMS 2021 150th Annual Meeting & Exhibition Supplemental Proceedings

Part of the book series: The Minerals, Metals & Materials Series ((MMMS))

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Abstract

The continued evolution in nanoelectronics and nanophotonics has been made possible by the recent developments in Atomic Layer Deposition and Atomic Layer Etching. While uniform deposition of conformal films with controllable thickness is a key feature of Atomic Layer Deposition, Atomic Layer Etching offers the advantages of controlled removal of chemically modified areas. Various case studies of the applications of these technologies in dielectrics, metals and diffusion barriers will be discussed.

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Authors and Affiliations

  1. Interdisciplinary Program in Materials Science & Engineering, New Jersey Institute of Technology, Newark, NJ, 07102, USA

    Samiha Hossain, Oktay H. Gokce & N. M. Ravindra

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  1. Samiha Hossain
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  2. Oktay H. Gokce
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  3. N. M. Ravindra
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Correspondence to Oktay H. Gokce .

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    Hossain, S., Gokce, O.H., Ravindra, N.M. (2021). Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes. In: TMS 2021 150th Annual Meeting & Exhibition Supplemental Proceedings. The Minerals, Metals & Materials Series. Springer, Cham. https://doi.org/10.1007/978-3-030-65261-6_20

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