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Part of the book series: NATO ASI Series ((NSSB,volume 200))

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Abstract

During the last few years thin film electroluminescence (TFEL) has emerged as one important technical application of optical properties in II–VI compounds. The thin film electroluminescent structure, schematically shown in fig. 1, is almost ideal for a flat panel display. Light is generated in a less than 2 μm thick thin film stack, which is deposited on a glass substrate. The light emitting film is deposited between two insulating films, and the light emitting area is defined by two electrodes that complete the structure. Light is emitted when the electric field exceeds about 1 MV/cm in the phosphor film. The thickness of the display is thus completely determined by the driving electronics and the thickness of the glass substrate. Crisp images and good contrast are further advantages. Since the decay time of the emission is about one millisecond or less, full video capability is achieved. Among monochromatic displays, the ZnS:Mn based yellow TFEL display panel is widely recognized to have excellent visual appearance.

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© 1989 Plenum Press, New York

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Törnqvist, R. (1989). Recent Development Trends in Thin Film Electroluminescent Displays. In: McGill, T.C., Sotomayor Torres, C.M., Gebhardt, W. (eds) Growth and Optical Properties of Wide-Gap II–VI Low-Dimensional Semiconductors. NATO ASI Series, vol 200. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-5661-5_2

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  • DOI: https://doi.org/10.1007/978-1-4684-5661-5_2

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-5663-9

  • Online ISBN: 978-1-4684-5661-5

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