Skip to main content

Electrical Properties of Proton Bombarded N-Type GaAs

  • Chapter
Ion Implantation in Semiconductors

Abstract

The effect of 60–380 KeV proton bombardments on the electrical properties of N-type GaAs has been studied by C-V and Hall-effect measurements. The thickness of the semi-insulating layer produced by the bombardments is nearly equal to the projected proton range. Prom Hall-effect measurements, it is found that the donor level of 0.15 eV is created by proton bombardments.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

eBook
USD 16.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. S. Furukawa et al, J. J. A. P. 11, 134 (1972)

    Google Scholar 

  2. T. Tsurushima, J. Phys. Soc. Japan 31, 1695 (1971)

    Article  ADS  Google Scholar 

  3. A. G. Foyt et al, Solid State Elec., 12, 209 (1969)

    Article  ADS  Google Scholar 

  4. B. R. Pruniaux et al, 2nd Int. Conf. Ion Impl. in Semi. p.212

    Google Scholar 

  5. G. H. Kinchin and R. S. Pease, Rep. Prog. Phys., 18, 1 (1955)

    Article  ADS  Google Scholar 

  6. G. E. Brehm and G. L. Pearson, J. Appl. Phys., 43, 568 (1972)

    Article  ADS  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1975 Plenum Press, New York

About this chapter

Cite this chapter

Harada, H., Fujimoto, M. (1975). Electrical Properties of Proton Bombarded N-Type GaAs. In: Namba, S. (eds) Ion Implantation in Semiconductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-2151-4_9

Download citation

  • DOI: https://doi.org/10.1007/978-1-4684-2151-4_9

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-2153-8

  • Online ISBN: 978-1-4684-2151-4

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics