Abstract
As an application of ion implantation technique outside semiconductor fields, the technique may be useful for metal surface treatments. Because, the depth distribution of treated surface, dose of element, and selection of doping element can be easily controlled externally by changing the ion beam energy, current, and kinds of ions, respectively. Moreover, this technique has the potentiality in the fabrication of new metal compounds which cannot be expected under the conditions of the conventional thermal processing. As one of the application of surface treatment, surface hardening by boron has been studied. Some metallugical properties, wear properties, and magnetic properties of implanted substrates have been obtained.
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References
Picraux; Application of Ion Beams to Metals, Plenum, 1973.
Dearnaley; Ion Implantation, North-Holland, 1973.
T. Takagi, I. Yamada, and J. Ishikawa; IEEE Trans. NS-19, 2, 1972.
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© 1975 Plenum Press, New York
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Takagi, T., Yamada, I., Kimura, H. (1975). Iron Surface Treatment by Boron Implantation. In: Namba, S. (eds) Ion Implantation in Semiconductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-2151-4_42
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DOI: https://doi.org/10.1007/978-1-4684-2151-4_42
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4684-2153-8
Online ISBN: 978-1-4684-2151-4
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