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In Situ Epitaxial Growth of the Gd-Ba-Cu-O Superconducting Thin Films on (100) LaAlO3 by Dc-Magnetron Sputtering Using Single Planar Target

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Science and Technology of Thin Film Superconductors 2

Abstract

We report in situ epitaxial growth of the GdBa2Cu3O7 superconducting thin films on (100) LaA103 single crystal substrates by dc-magnetron sputtering using single planar target. The best films had Tco of 92.5K, transition width of 0.57K and critical current density of 3.6x106A/cm2 at 77K with very good reproducibility. The film structure was studied by X-ray spectra in different diffraction geometries. In the Bragg-Brentano (BB) focusing geometry merely (00L) lines of the film are observed indicating c-axis normal to the substrate surface. The rocking curve of the film is very narrow (0.43 degree, full width at half maximum). In the SeemannBohlin (SB) focusing geometry the structureless spectrum indicates single crystalline growth of the film.

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© 1990 Plenum Press, New York

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Li, H.C. et al. (1990). In Situ Epitaxial Growth of the Gd-Ba-Cu-O Superconducting Thin Films on (100) LaAlO3 by Dc-Magnetron Sputtering Using Single Planar Target. In: McConnell, R.D., Noufi, R. (eds) Science and Technology of Thin Film Superconductors 2. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-1345-8_14

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  • DOI: https://doi.org/10.1007/978-1-4684-1345-8_14

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-1347-2

  • Online ISBN: 978-1-4684-1345-8

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