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Science and Technology of Thin Film Superconductors 2

  • Robert D. McConnell
  • Rommel Noufi

Table of contents

  1. Front Matter
    Pages i-xvii
  2. Sputtering

    1. K. Wasa, H. Adachi, Y. Ichikawa, K. Hirochi, T. Matsushima, A. Enokihara et al.
      Pages 1-10
    2. H. Soltner, B. Kabius, C. L. Jia, P. Prieto, U. Poppe, J. Schubert et al.
      Pages 11-11
    3. J.-M. Triscone, Ø. Fischer, L. Antognazza, O. Brunner, A. D. Kent, L. Miéville et al.
      Pages 13-22
    4. R. T. Kampwirth, J. M. Grace, D. J. Miller, D. B. McDonald, K. E. Gray, P. H. Andersen et al.
      Pages 39-46
    5. P. Arendt, N. Elliott, D. W. Cooke, R. Dye, E. Gray, K. Hubbard et al.
      Pages 47-56
    6. J. Talvacchio, M. G. Forrester, J. R. Gavaler, T. T. Braggins
      Pages 57-66
    7. L. H. Allen, E. J. Cukauskas, P. K. Damme
      Pages 67-74
    8. D. K. Aswal, S. C. Karandikar, S. K. Gupta, S. C. Sabharwal, L. C. Gupta, M. K. Gupta
      Pages 75-84
    9. J. Geerk, Q. Li, G. Linker, O. Meyer, F. Ratzel, J. Remmel et al.
      Pages 91-91
    10. G. Larsson, T. I. Selinder, U. Helmersson, S. Rudner
      Pages 93-100
    11. W. Y. Lee, J. Salem, V. Y. Lee, T. C. Huang, V. Define, R. Savoy
      Pages 101-101
    12. R. Pinto, P. R. Apte, A. G. Chourey, V. S. Shirodkar
      Pages 119-124
    13. R. E. Soltis, E. M. Logothetis, D. W. Hoffman, J. W. Hangas, S. Shinozaki, M. Aslam et al.
      Pages 125-129
    14. M. R. Tseng, J. J. Chu, Y. T. Huang, W. N. Wang, P. T. Wu
      Pages 131-137
    15. Senzu Yang, Peiheng Wu, Zhengming Ji, Zhijian Sun, Yuan Li, Shiyuan Zhang et al.
      Pages 145-145
    16. Ping Zhou, Zi-wen Dong, Gui-rong Liu, Qian-sheng Yang, Zhong-xian Zhao
      Pages 147-151
  3. Laser Deposition

    1. David P. Norton, Douglas H. Lowndes, D. K. Christen, E. C. Jones, J. D. Budai, Thomas D. Ketcham et al.
      Pages 157-165
    2. Vladimir Cherny, Andrew Pospeloff, Valery Dneprovsky, Evgeny Kaydashev
      Pages 167-167
    3. G. Brorsson, Z. Ivanov, P.-Å. Nilsson
      Pages 169-175
    4. D. W. Chung, T. L. Peterson, R. Fletcher, P. M. Hemenger, I. Maartense, P. T. Murray
      Pages 177-185
    5. D. K. Fork, G. A. N. Connell, D. B. Fenner, J. B. Boyce, Julia M. Phillips, T. H. Geballe
      Pages 187-196
    6. T. Frey, St. Siegmann, H.-J. Güntherodt, L. Drabeck, G. Grüner, U. Ebels et al.
      Pages 197-203
    7. N. J. Ianno, D. Thompson, B. Johs, S. H. Liou, John A. Woollam
      Pages 205-214
    8. David P. Norton, Douglas H. Lowndes, J. D. Budai, S. J. Pennycook, B. C. Sales, D. K. Christen
      Pages 215-215
  4. New and Different Growth Techniques

    1. Kunimitsu Uchinokura, Yoshimi Nakayama, Ichiro Tsukada, Ichiro Terasaki, Atsutaka Maeda
      Pages 223-231
    2. Takashi Hirao, Takeshi Kamada, Shigenori Hayashi, Masatoshi Kitagawa, Kiyotaka Wasa
      Pages 233-242
    3. R. N. Bhattacharya, R. Noufi, L. L. Roybal, R. K. Ahrenkiel, P. Parilla, A. Mason et al.
      Pages 243-250
    4. A. M. Hermann, H. Duan, F. Arammash, R. J. Deck, D. Marsh, W. Kiehl et al.
      Pages 251-260
    5. I. Bozovic, J. N. Eckstein, D. G. Schlom, J. S. Harris
      Pages 267-272
    6. J. Erxmeyer, A. Balogh, G. Dortmann, J. Steiger, O. Boebel, A. Weidinger
      Pages 273-277
    7. M. Ghanashyam Krishna, G. K. Muralidhar, G. Mohan Rao, K. Narasimha Rao, S. Mohan
      Pages 289-289
    8. D. H. Kuo, R. J. Lin, P. T. Wu
      Pages 291-299
    9. A. Schuhl, R. Cabanel, B. Ghyselen, G. Creuzet
      Pages 301-301
    10. R. Singh, S. Sinha, N. J. Hsu, J. T. C. Ng, P. Chou, H. S. Ullal et al.
      Pages 303-309
  5. Characterization

    1. D. H. Shin, J. Silcox, S. E. Russek, D. K. Lathrop, B. Moeckly, R. A. Buhrman
      Pages 319-328
    2. H. Ihara, T. Shimomura, N. Terada, M. Jo
      Pages 329-329
    3. S. E. Russek, D. K. Lathrop, B. H. Moeckly, R. A. Buhrman, D. H. Shin, J. Silcox
      Pages 331-340

About this book

Introduction

This conference is the second on the Science and Technology of Thin Film Superconductors. It proved to be an excellent forum for these specialists in thin film superconductivity. The conference, held April 30-May 4, 1990, in Denver, Colorado, hosted 170 researchers from 17 countries. The response to the conference again emphasized the need for a meeting devoted to the science and technology of thin film superconductors. The breadth of artic1es and advances made in this technology since the first conference in November 1988, reflect on the maturity of the topic. These proceedings contain artic1es on deposition methods by sputtering, e1ectron beam evaporation, resistive evaporation, laser ablation, chemical vapor deposition and electrodeposition, and on other studies related to substrates, thermodynamics of formation, grain boundaries and weak links, characterization, and some practical applications. The program committee was pleased with the quality of the publications and contributed articles. This conference was highlighted by a fuU day dedicated to presentations from the federallaboratories, discussing a wide range of topics on the fabrication, characterization, and theory of high-temperature superconductor thin films. Other highlights at the conference dealt with (1) critical parameters or problems in measuring critical current density and other important parameters, and (2) problems of scale-up, reproducibility, and amenability to device fabrication. It became evident from the presentations that three issues were developing into critical issues for the ultimate practical application of high­ temperature superconductor thin films.

Keywords

ablation superconductivity thin films

Editors and affiliations

  • Robert D. McConnell
    • 1
  • Rommel Noufi
    • 1
  1. 1.Solar Energy Research InstituteGoldenUSA

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