Abstract
Application field of microwave produced plasmas is widely expanding. Microwave plasmas can be considered as species sources and the developed products are ion sources, photon sources (lasers, lamps) and neutral sources (surface treatment downstream the discharge). Microwave plasmas are also used for deposition and etching (with or without magnetic field). Hence, choice of a microwave excitation structure is obviously depending on the application (either in the plasma bulk or downstream the discharge) and the reactor type (pressure range, dimensions of the reaction chamber). Several excitation structures are able to solve a specific problem. However, the determination of the optimized structure requires a good knowledge of struc ture characteristics. Therefore, this paper is divided in three parts. We first recall basic principles of microwave discharges production (energy transfer, discharge sustaining conditions, stability, role of magnetic field). Secondly, we review the main types of excitation structures. Thirdly, we present some typical reactors.
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References
A. D. MacDonald and S. J. Tetenbaum, “Microwave Breakdown in Gaseous Electronics”, M. N. Hirsch and J. K. Oskam eds, Vol 1, Academic press New York (1978).
J. Marec, E. Bloyet, M. Chaker, P. Leprince and P. Nghiem, Part B, Micro wave discharges in “Electrical Breakdown and Discharges in Gases” E. E. Kunhardt and L. Luessen eds,Plenum Publ. Corp., New York (1983).
W. P. Allis, S. J. Buchsbaum and A. Bers, Electromagnetic propagation in isotropic plasmas, in “Waves in anisotropic plasmas”, MIT Press Cambridge (1963).
C. Boisse-Laporte, A. Granier, E. Dervisevic, P. Leprince and J. Marec, Microwave discharges produced by surface wave in argon gas, J. Phys. D: Appl; Phvs. 20: 204 (1987).
W. M. Glaude, M. Moisan, R. Pantel, P. Leprince and J. Marec, Axial elec tron density and wave distribution along a plasma column sustained by the propagation of a microwave surface wave, J. Appl. Phys. 51: 5693 (1980).
C. Boisse-Laporte, A. Granier, E. Bloyet, P. Leprince and J. Marec, Influence of the excitation frequency on surface wave argon discharges. Study of the light emission, J. Appl. Phys. 61:1740 (1987).
C. Boisse-Laporte, Etude du transfert d’énergie d’une onde à un plasma, Thèse Université Paris-Sud, Orsay (1989).
S. Pasquiers, C. Boisse-Laporte, A. Granier, E. Bloyet, P. Leprince and J. Marec,Action of a static magnetic field on an argon discharge pro duced by a travelling wave, J. Appl. Phys. 65:1465 (1989).
J. Asmussen, Electron cyclotron resonance microwave discharges for etch ing and thin film depsition, J. Vac. Sci. Tech. A 7:883 (1989).
H. Rau and B. Trafford, Rotationnaly symmetrical electric fields and el ectron density distributions in a microwave plasma used in optical fibre production, J. Phvs. D: Appl. Phys. 22:1613 (1990).
H. Rau and B. Trafford, A microwave plasma bell reactor experiment and simulation, J. Phvs. D: Appl. Phys. 23:1637 (1990).
M. Geisler, J. Kieser, E. Rauchle and R. Wilhem, Elongated microwave ECRH plasma source, J. Vac. Sci. Tech. A to be published.
K. Suzuki, S. Okudaira, N. Sukudo and I. Kanomata, Microwave plasma etching, Jap. J. Appl. Phys. 16:1979 (1977).
M. Pichot, A. Durandet, J. Pelletier, Y. Arnal and L. Vallier, Microwave multipolar plasma excited by distributed electron cyclotron reson ance: concept and performances, Rev. Sci. Instrum. 59:1072 (1988).
J. Hopwood, D. K. Reinhard and J. Asmussen, Charged particles densities and energy distributions in a multipolar electron cyclotron resonance plasma etching source, J. Vac. Sci. Tech. A 8:3103 (1990).
B. Andries, S. Saada and P. Parrens, A surface wave reactor of large diameter with localized ECR effect, CIPG, 146 (1991).
R. Safari, C. Boisse-Laporte, A. Granier, M. Lefebvre and M. Pealat, Investigation of flowing microwave oxygen discharge by CARS, ESCAMPIG, 258 (1990).
C. Chave, C. Boisse-Laporte, J. Marec and P. Leprince, Nitrogen microwa ve discharge for metallic surface nitriding, ICSPE, 151 (1990).
F. Normand, A. Granier, J. Marec and P. Leprince, Surface treatment of Polypropylen by oxygen microwave dischargge, ICSPE, 17 (1990).
L. Mahoney and J. Asmussen, A compact resonant cavity, five centimeters multiscup, ECR broad-beam ion source, Rev. Sci. Instrum. 61:285 (1990).
R. Messier, From diamond-like carbon to diamond coatings, Thin Solid film, 153:1 (1987).
W. Schreffer, U. V. Curable materials response and its relationship to power level and lamp spectra, Radtech. Conf., 29 (1990).
C. P. Christiensen, C. Gordon, C. Moutoulas and B. J. Feldman, High repetition rate XeCl waveguide laser without gas flow, Opt. Letters, 12:169 (1987).
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© 1992 Springer Science+Business Media New York
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Leprince, P., Marec, J. (1992). Microwave Excitation Technology. In: Capitelli, M., Gorse, C. (eds) Plasma Technology. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-3400-6_12
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DOI: https://doi.org/10.1007/978-1-4615-3400-6_12
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