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Plasma Technology

Fundamentals and Applications

  • Mario Capitelli
  • Claudine Gorse

Table of contents

  1. Front Matter
    Pages i-viii
  2. A. M. Ignatov, A. A. Rukhadze
    Pages 1-9
  3. Lev Pyatnitsky
    Pages 11-26
  4. G. Dilecce
    Pages 27-44
  5. M. Capitelli, R. Celiberto, G. Capriati, C. Gorse, S. Longo
    Pages 59-80
  6. Riccardo d’Agostino, Francesco Fracassi
    Pages 93-107
  7. Alexander W. Koch
    Pages 109-123
  8. Luigi Civitano, Egisto Sani
    Pages 153-166
  9. Philippe Leprince, Jean Marec
    Pages 167-184
  10. H. J. Hopman, R. M. A. Heeren
    Pages 185-201
  11. Back Matter
    Pages 223-224

About this book

Keywords

Plasma dynamics integrated circuit laser material modeling plasma physics

Editors and affiliations

  • Mario Capitelli
    • 1
  • Claudine Gorse
    • 1
  1. 1.Centro di Studio per la Chimica dei Plasmi del CNRUniversity of BariBariItaly

Bibliographic information