Abstract
Electron collisions are the most fundamental processes in a plasma for gaseous dielectrics or plasma processing.1,2 The plasma is sustained mainly by the process of electron-impact ionization. Electron collision produces various active particles (i.e., excited species, ions, and radicals), which, in turn, induce many chemical processes of practical importance. Those inelastic collisions are also important in slowing down of the electrons accelerated by the electric field. Elastic scattering should be taken into account when we determine the distribution of electron velocity, which controls the transport processes of electrons in the plasma. Finally, electron-attaching process plays a key role in the gaseous dielectrics. Thus, in the study of gaseous dielectrics or plasma processing, it is essential to have the cross section data for such processes of electron collisions with atoms and molecules.
The growing need for modeling of complex dielectric and plasma systems highlights the continuing need for reliable fundamental data. In this discussion panel, five expert opinions are presented concerning the data needs of the gaseous dielectrics and plasma processing communities, the availability of such data, and potential applications of these data. An unofficial transcript of the discussion sessions that followed the presentations is presented at the end of this chapter. — J. K. Olthoff, Chair
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Olthoff, J.K., Becker, K., Garscadden, A., Herron, J., Itikawa, Y., Marode, E. (2001). Discussion Panel: Databases for Gaseous Dielectrics and Plasma Processing. In: Christophorou, L.G., Olthoff, J.K. (eds) Gaseous Dielectrics IX. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-0583-9_84
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DOI: https://doi.org/10.1007/978-1-4615-0583-9_84
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