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Gaseous Dielectrics IX

  • Loucas G. Christophorou
  • James K. Olthoff

Table of contents

  1. Front Matter
    Pages i-xiv
  2. Basic Physics of Gaseous Dielectrics

    1. Front Matter
      Pages 1-1
    2. Jaime de Urquijo
      Pages 25-36
    3. J. de Urquijo, E. Basurto, J. L. Hernández-Ávila
      Pages 37-42
    4. A. N. Goyette, J. de Urquijo, Yicheng Wang, L. G. Christophorou, J. K. Olthoff
      Pages 43-48
    5. Yicheng Wang, R. L. Champion, I. V. Dyakov, B. L. Peko
      Pages 49-54
    6. Wiesława Barszczewska, Iwona Szamrej
      Pages 55-61
    7. Loucas G. Christophorou, James K. Olthoff
      Pages 63-74
    8. W. Barszczewska, J. Kopyra, J. Wnorowska, I. Szamrej, M. Foryś
      Pages 75-78
    9. A. F. Borghesani, G. Bressi, G. Carugno, E. Conti, D. Iannuzzi
      Pages 85-90
  3. Gaseous Dielectrics as Plasma Processing Gases

    1. Front Matter
      Pages 93-93
    2. B. N. Ganguly, J. D. Scofield, P. Bletzinger
      Pages 95-101
    3. Rüdiger Foest, Florian Sigeneger, Martin Schmidt
      Pages 113-118
    4. Jason E. Sanabia, John H. Moore
      Pages 119-126
    5. C. Q. Jiao, C. A. DeJoseph Jr., P. D. Haaland, A. Garscadden
      Pages 127-132
  4. Modeling and Simulation of Gas-Discharge Behavior

    1. Front Matter
      Pages 133-133
    2. M. Petit, N. Jidenko, A. Goldman, M. Goldman, E. Odic, J. P. Borra
      Pages 143-148
    3. Nickolay L. Aleksandrov, Edward M. Bazelyan, Roy B. Carpenter Jr., Mark M. Drabkin, Yury P. Raizer
      Pages 149-154
    4. Zhengzhong Zeng, Yuchang Qiu, Edmund Kuffel
      Pages 155-160
    5. H. Itoh, T. Fukuyama, K. Yamamoto, N. Ikuta
      Pages 169-174
    6. Nickolay L. Aleksandrov, Edward M. Bazelyan
      Pages 175-180
    7. John Horwath, Daniel Schweickart, Robert Penno
      Pages 181-185
  5. Partial Discharges: Basic Mechanisms and Applications

    1. Front Matter
      Pages 197-197
    2. T. Takahashi, M. F. Fréchette, R. Y. Larocque, C. Hudon, T. Umemura, S. Matsumoto et al.
      Pages 205-210
    3. Shinya Ohtsuka, Masaki Koumura, Kazuhisa Eguchi, Mengu Cho, Sadayuki Yuasa, Shigemitu Okabe et al.
      Pages 211-216
    4. M. F. Fréchette, R. Y. Larocque, C. Hudon, T. Umemura, S. Matsumoto, T. Takahashi
      Pages 223-231
    5. N. Hayakawa, T. Ishida, K. Hatta, T. Yamada, T. Ueda, H. Okubo
      Pages 233-238
    6. T. Yamada, T. Ishida, N. Hayakawa, S. Yuasa, S. Okabe, H. Okubo
      Pages 239-244
    7. T. Ozaki, C. Araki, S. Matsumoto, T. Umemura, C. Hudon, M. Frechette
      Pages 245-250
    8. S. Matsumoto, T. Umemura, H. Okubo, M. F. Fréchette, C. Hudon
      Pages 251-256
    9. Robert H. Stark, Hisham Merhi, Chunqi Jiang, Karl H. Schoenbach
      Pages 257-262
    10. Chunqi Jiang, Robert H. Stark, Karl H. Schoenbach
      Pages 263-268
  6. New Studies of Dielectric Gases/Mixtures

    1. Front Matter
      Pages 269-269
    2. Shinya Ohtsuka, Masaki Koumura, Mengu Cho, Yousuke Hashimoto, Michiaki Nakamura, Masayuki Hikita
      Pages 295-300

About this book

Introduction

Gaseous Dielectrics IX covers recent advances and developments in a wide range of basic, applied, and industrial areas of gaseous dielectrics.

Keywords

Plasma dielectrics modeling simulation

Editors and affiliations

  • Loucas G. Christophorou
    • 1
  • James K. Olthoff
    • 1
  1. 1.National Institute of Standards and TechnologyGaithersburgUSA

Bibliographic information

  • DOI https://doi.org/10.1007/978-1-4615-0583-9
  • Copyright Information Kluwer Academic / Plenum Publishers, New York 2001
  • Publisher Name Springer, Boston, MA
  • eBook Packages Springer Book Archive
  • Print ISBN 978-1-4613-5143-6
  • Online ISBN 978-1-4615-0583-9
  • Buy this book on publisher's site