Abstract
The stabilization of metallic surfaces against corrosion processes in natural and industrial environment rests on the onset of passivity condition with a subsequent drastic reduction of the corrosion rate of the underlying metallic substrate. In spite of a longstanding controversy it is now universally accepted that a passive metal is usually covered by a thin or thick external layer the whose physicochemical properties control the evolution of corrosion process as well as the possible reactions occurring at metal/oxide and oxide/electrolyte interfaces.1,2 In many cases of practical importance, passivity of metals is reached in presence of very thin (few nm thick) layer which makes the complete physico-chemical characterization a very complex task requiring the use of different powerful in situ and/or ex situ techniques. This is particularly true if we want to get information pertaining to the chemical composition, morphology, crystalline or disordered nature and solid-state properties of the passive layers.
Many useful information on the film composition can be gathered from ex situ techniques (Auger, ESCA, XPS, SIMS, RBS, GDOES) although they suffer some limitations and drawback specially when investigating very thin films, owing to the risk of changing structure and composition of the passive film on going from the potentiostatic control in solution to the vacuum. According to this a large agreement exists on the advantages of passive film characterization based on in situ techniques or controlled transfer under inert atmosphere on going from electrochemical cell to analytical equipment.3–11
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
D. Landolt, Corrosion and Surface Chemistry of Metals, EPFL Press, Lausanne, CH, 2007.
H.-H. Streblow, in Advances in Electrochemical and Engineering Science, R.C. Alkire, D.M. Kolb, Editors, Vol. 8, Wiley-VCH, Weinheim, FRG, 2003, p. 271.
Passivity of Metals, Proceedings of the 4th International Symposium on Passivity, R.P. Frankental, J. Kruger, Editors, The Electrochemical Society Inc., Pennington, NJ, 1978.
Passivity of Metals and Semiconductors, Proceedings of the 5th International Symposium on Passivity, M. Froment, Editor, Elsevier, Oxford, 1983.
Passivity of Metals and Semiconductors, Proceedings of the 6th International Symposium on Passivity, N. Sato, K. Hashimoto, Editors, Pergamon Press, Oxford, 1990.
Oxide Films on Metals and Alloys, B.R. MacDougall, R.S. Alwitt, T.A. Ramanarayanan, Editors, PV 92-22, The Electrochemical Society Inc., Pennington, NJ, 1992; Oxide Films on Metals and Alloys, K. Hebert, G.E. Thompson, Editors, PV 94-25, The Electrochem Society Inc., Pennington, NJ, 1994.
Passivity of Metals and Semiconductors, Proceedings of the 7th International Symposium on Passivity, K.E. Heusler, Editor, Trans Tech. Publications Ltd., Zurich, 1995.
H.H. Uhlig Memorial Symposium, F. Mansfeld, A. Asphahani, H. Böhni, R. Latanision, Editors, PV 94-26, The Electrochem Society Inc., Pennington, NJ, 1995.
Passivity and its Breakdown, P. Natishan, H. S. Isaacs, M. Janik-Czackor, V. A. Macagno, P. Marcus, M. Seo, Editors, PV 97-26, The Electrochemical Society Inc., Pennington, NJ, 1998.
Critical Factors in Localized Corrosion III, R. G. Kelly, G. S. Frankel, P. M. Natishan, R.C. Newman, Editors, PV 98-17, The Electrochemical Society Inc., Pennington, NJ, 1999.
Passivity and Localized Corrosion, M. Seo, B. MacDougall, H. Takahashi, R.G. Kelly, Editors, PV-99-27, The Electrochemical Society Inc., Pennington, NJ, 1999.
Passivity of Metals and Semiconductors, Proceedings of the 8th International Symposium on Passivity, M. B. Ives, J.L. Luo, J.R. Rodda, Editors, PV-99-42, The Electrochemical Society Inc., Pennington, NJ, 2001.
Surface Oxide Films, V. Birss, L.D. Burke, A.R. Hillmann, R.S. Lillard, Editors, PV-2003-25, The Electrochemical Society Inc., Pennington, NJ, 2004.
Passivity of Metals and Semiconductors, and properties of Thin Oxide Layers, Proceedings of the 9th International Symposium on Passivity, P. Marcus, V. Maurice, Editors, Elsevier, Amsterdam, 2006.
W. H. Brattain, C.G.B. Garrett, Bell System Tech. J., 34 (1955) 129; Phys. Rev., 99 (1955) 177.
M. Green, in Modern Aspects of Electrochemistry, Ed. by B.E. Conway, J.O’M. Bockris, Butterworths, London, 1959, vol. 2, p. 343.
H. Gerischer, in Advances in Electrochemistry and Electrochemical Engineering, Ed. by P. Delahay, Interscience Publishers, New York, 1961, Vol.1, p. 139.
V. A. Myamlin, Yu. V. Pleskov, Electrochemistry of Semiconductors, Plenum Press, New York, 1967.
H. Gerischer, in Physical Chemistry. An Advanced Treatise, Ed. by H. Eyring, D. Henderson, W. Jost, Academic Press, New York, 1970, vol. IXA, p. 463.
S.R. Morrison, Electrochemistry at Semiconductor and Oxidized Metal Electrodes, Plenum Press, New York, 1980.
Yu. V. Pleskov, Yu. Ya. Gurevich, Semiconductor Photoelectrochemistry, Consultants Bureau, New York, 1986.
A. Hamnett, in Comprehensive Chemical Kinetics, Ed. by R.G. Compton, Elsevier Science, Oxford, 1987, vol. 27, p. 61.
J.O’M. Bockris, S.U.M. Khan, Surface Electrochemistry, Plenum Press, New York, 1993.
N. Sato, Electrochemistry at Metals and Semiconductor Electrodes, Elsevier Science B.V., Amsterdam, 1999.
R. Memming, Semiconductor Electrochemistry, Wiley-VCH, Weinheim, 2001.
L. Young, Anodic Oxide Films, Academic Press, London, 1961.
D.A. Vermilyea, in Advances in Electrochemistry and Electrochemical Engineering, Ed. by P. Delahay, Interscience Publishers, New York, 1963, Vol. 3, p. 211.
K.E. Heusler, K.S. Yun, Electrochim. Acta, 22 (1977) 977.
H.J. Engell, Electrochim. Acta, 22 (1977) 987.
H. Gerischer, Corrosion Sci., 29 (1989) 257; Corrosion Sci., 31 (1990) 81.
H. Gerischer, Electrochim. Acta, 35 (1990) 1677.
J.W. Schultze, M.M. Lohrengel, Electrochim. Acta, 45 (2000) 2499.
F. Di Quarto, M. Santamaria, Corrosion Eng. Sci. Tech., 39 (2004) 71.
F. Mott: Proc. Roy. Soc.(A), 171 (1939) 27.
W. Shottky: Zeits. Physik, 113 (1939) 367.
J.F. Dewald, Bell Syst. Tech. J., 39 (1960) 615; J. Phys. Chem. Solids, 14 (1960) 155.
U. Stimming, Electrochim. Acta, 31 (1986) 415.
L. Peter, in Comprehensive Chemical Kinetics, Ed. by R.G. Compton, Elsevier Science, Oxford, 1989, vol. 29, p. 382.
F. Di Quarto, C. Sunseri, S. Piazza, M. Santamaria, in Handbook of Thin Films, Ed. by H.S. Nalwa, Academic Press, San Diego, CA, 2002, vol.2, p. 373.
F. Di Quarto, M. Santamaria, C. Sunseri, in Analytical Methods in Corrosion Science and Technology, Ed. by P. Marcus, F. Mansfeld, Taylor, Francis, Boca Raton, 2005, p. 697.
M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, Pergamon Press, Oxford, 1966.
K. Uosaki, H. Kita, J. Electrochem. Soc., 130 (1983) 895.
W.H. Laflère, R.L. Van Meirhaeghe, F. Cardon, W.P. Gomes, Surface Sci., 59 (1976) 401;ibidem, 74, (1978) 125.
W.H. Laflère, R.L. Van Meirhaeghe, F. Cardon, W.P. Gomes, J. Appl. Phys.D, 13 (1980) 2135.
M. Tomkiewicz, J. Electrochem. Soc., 126 (1979) 1505.
G. Cooper, J. A. Turner, A.J. Nozik, J. Electrochem. Soc., 129 (1982) 1973.
H.O. Finklea, J. Electrochem. Soc., 129 (1982) 2003.
W.P. Gomes, F. Cardon, in Progress in Surface Science, Pergamon Press, Oxford, 1982, vol. 12, p. 155.
H. Gerischer, R. McIntyre, J. Chem. Phys., 83 (1985) 1363.
D.S. Ginley, M.A. Butler, in Semiconductor Electrodes, Ed. by H.O. Finklea, Elsevier Science, Oxford, 1988, p. 335.
N. Sato, K. Kudo, T. Noda, Z. Physik. Chem. N.F., 98 (1975) 271.
P. Marcus, V. Maurice, in Interfacial Electrochemistry, Ed. by A. Wieckowski, M. Dekker, New York, 1999, p. 541.
U. Konig, J. W. Shultze, in Interfacial Electrochemistry, Ed. A. Wieckowski, M. Dekker, New York, 1999, p. 649.
H. Streblow, P. Marcus in Analytical Methods in Corrosion Science and Technology, Ed. by P. Marcus, F. Mansfeld, Taylor and Francis, Boca Raton, 2005, p. 1.
V. Maurice, P. Marcus, in Analytical Methods in Corrosion Science and Technology, Ed. by P. Marcus, F. Mansfeld, Taylor and Francis, Boca Raton, 2005, p. 133.
C.-O.A. Olsson, D. Landolt, in Analytical Methods in Corrosion Science and Technology, Ed. by P. Marcus, F. Mansfeld, Taylor and Francis, Boca Raton, 2005, p. 733.
S.U.M. Khan, W. Shmickler, J. Electroanal. Chem., 108 (1980) 329.
P. Schmuki, H. Böhni, Electrochim. Acta, 40 (1995) 775.
M. Büchler, P. Schmuki, H. Böhni, T. Stenberg, T. Mäntylä: J. Electrochem. Soc., 145 (1998) 378.
E. Sikora, D. D. MacDonald, J. Electrochem. Soc., 147 (2000), 4087.
V.A. Alves, C.M.A. Brett, Electrochim. Acta, 47 (2002) 2081.
Y.M. Zeng, J. L. Luo, Electrochim. Acta, 48 (2003) 35.
I. Diez-Perez, P. Gorostiz, F. Sanz: J. Electrochem. Soc., 150 (2003) B348.
F. Gaben, B. Vullemin, R. Oltra, J. Electrochem. Soc., 151 (2004) B595.
D.G. Li, Y.R. Feng, Z.Q. Bai, J.W. Zhu, M.S. Zheng, Electrochim. Acta, 52 (2007) 7877.
S. Fujimoto, H. Tsuchiya, Corr. Sci., 49 (2007) 195.
J. Amri, T. Souier, B. Maliki, B. Baroux, ibidem, 50 (2008) 431.
J.S.Blakemore, Semiconductor Statistics, Pergamon Press, Oxford (1962).
H. Gerischer, J. Phys. Chem., 89 (1985) 4249.
H. Gerischer, R. McIntyre, D. Scherson, W. Stork, J. Phys. Chem. Phys., 91 (1987) 1930.
D.L. Losee, J. Appl. Phys., 46 (1975) 2204.
G. Nogami, J. Electrochem. Soc., 129 (1982) 2219.
E.C. Dutoit, R.L. Van Meirhage, F. Cardon, W. P. Gomes, Ber. Bunsenges. Phys. Chem., 79 (1975) 1206.
V. Macagno, J.W. Schultze, J. Electroanal. Chem., 180 (1984) 157.
F. Di Quarto, A. Di Paola, C. Sunseri, Electrochim. Acta, 26, (1981) 1177.
F. Di Quarto, C. Sunseri, S. Piazza, Ber. Bunsenges. Phys. Chem., 90 (1986) 549.
F. Di Quarto, S. Piazza, C. Sunseri, Electrochim. Acta, 35 (1990) 99.
F. Di Quarto, V.O. Aimiuwu, S. Piazza, C. Sunseri, Electrochim. Acta, 36 (1991) 1817.
M.H. Cohen, H. Fritzsche, S.R. Ovishinsky, Phys. Rev. Lett., 22 (1969) 1065.
D.Adler, Amorphous Semiconductors, CRS Press, Cleveland, 1971.
N.F. Mott, E.A. Davis, Electronic Processes in Non-crystalline Materials, 2nd Ed., Clarendon Press, Oxford, 1979.
J. Tauc, Amorphous and Liquid Semiconductors, Plenum Press, London, 1974.
Amorphous Semiconductors, edited by M.H. Brodsky, Springer Verlag, Berlin, 1979.
Physical Properties of Amorphous Materials, edited by D. Adler, B.B. Schwartz, M.C. Steele, Plenum Press, New York, 1985.
W.E. Spear, P.G. Le Comber, A.J. Snell, Philos. Mag. B, 38 (1978) 303.
R.A. Abram, P.J. Doherty, Philos. Mag. B, 45 (1982) 167.
J.D. Cohen, D.V. Lang, Phys. Rev. B, 25, (1982) 5321; D.V. Lang, J.D. Cohen, J.P. Harbison, Phys. Rev. B, 25, (1982) 5285.
I. W. Archibald, R. A. Abram, Philos. Mag. B, 48, (1983) 111.
I. W. Archibald, R. A. Abram, Philos. Mag. B, 54, (1986) 421.
W. E. Spear, S. H. Baker, Electrochim. Acta, 34, (1989) 1691.
M. H. Dean, U. Stimming, J. Electroanal. Chem., 228, (1987) 135.
M. H. Dean, U. Stimming, J. Phys. Chem., 93, (1989) 8053.
S. Piazza, C. Sunseri, F. Di Quarto, A.I. Ch.E. Journal, 38 (1992) 219.
F. Di Quarto, M. Santamaria, in Surface Oxide Films, V. Birss, L. Burke, A. R. Hillman, R. S. Lillard, Editors, PV 2003–25, The Electrochemical Society Proceeding Series, Pennington, NJ, 2004, p. 86.
F. Di Quarto, F. La Mantia, M. Santamaria, Electrochim. Acta, 50, (2005) 5090.
F. Di Quarto, F. La Mantia, M. Santamaria, Corr. Sci., 49, (2007) 186.
F. La Mantia, M. Santamaria, F. Di Quarto, in Passivation of Metals and Semiconductors, and properties of Thin Oxide Layers, Ed. by P. Marcus, V. Maurice, Elsevier, Amsterdam, 2006, p. 343.
C. da Fonseca, M. G. Ferreira, M. da Cunha Belo, Electrochim. Acta, 39, (1994) 2197.
E. Becquerel, C. R. Hebd. Séan. Acad. Sci., 9 (1839) 561.
A.W. Copeland, O.D. Black, A.B. Garrett, Chem. Rev., 31 (1942) 177.
E. K. Oshe, I. L. Rozenfel’d, Elektrokhimiya, 4 (1968) 1200.
R. Williams: J. Chem. Phys., 32 (1960) 1505.
W. Paatsch: J. Phys., 38 (1977) C5–151
E. Angelini, M. Maja, P. Spinelli: J. Phys., 38 (1977) C5–261.
S. M. Wilhelm, Y. Anizawa, Chaung-Yi Liu, N. Hackermann, Corros. Sci., 22 (1982) 791.
A. Fujishima, K. Honda, Nature, 238 (1972) 37.
M. A. Butler, J. Appl. Phys., 48 (1977) 1914.
Faraday Discussion No.70, The Royal Society of Chemistry, London, 1980.
Photoeffects at Semiconductor-Electrolyte Interfaces, ACS Symposium Series 146 Ed. A. J. Nozik, American Chemical Society, Washington D.C., 1981.
F. Di Quarto, G. Russo, C. Sunseri, A. Di Paola: J. Chem. Soc. Faraday Trans. 1, 78 (1982) 3433.
R.H. Wilson. J. Appl. Phys., 48 (1977) 4292.
H. Reiss. J. Electrochem. Soc., 125 (1978) 937.
W.J. Albery, P.N. Bartlett, A. Hamnett, M.P. Dare-Edwards. J. Electrochem. Soc., 128 (1981) 1492.
F. El Guibaly, K. Colbow. J. Appl. Phys., 53 (1982) 1737.
W.W. Gärtner. Phys. Rev., 116 (1959) 84.
J. Reichman, Appl. Phys. Lett., 36 (1980) 574.
R.U. E’t Lam, D.R. Franceschetti, Mater. Res. Bull., 17 (1982) 1081.
F. Di Quarto, A. Di Paola, S. Piazza, C. Sunseri, Solar Energy Mater., 11 (1985) 419.
S.U.M. Khan, J.O’M. Bockris J. Appl. Phys., 52 (1981) 7270.
D.M. Pai, R.C. Enck. Phys. Rev. B, 11 (1975) 5163.
F. Di Quarto, S. Piazza, C. Sunseri. Electrochim. Acta, 38 (1993) 29.
M. Santamaria, F. Di Quarto, H. Habazaki, Corr. Sci., 50 (2008) 2012.
F. Di Quarto, S. Piazza, R. D’Agostino, C. Sunseri. J. Electroanal. Chem., 228 (1987) 119.
F. Di Quarto, S. Piazza, C. Sunseri. J. Chem. Soc., Faraday Trans. 1, 85 (1989) 3309.
S. Piazza, C. Sunseri, F. Di Quarto. J. Electroanal. Chem., 293 (1990) 69.
N.F. Mott, E.A. Davis, Electronic Processes in Non-crystalline Materials, 2nd Ed., Clarendon Press, Oxford, 1979, p.275.
D.L. Wood, J. Tauc, Phys. Review B, 5 (1972) 3144.
Di Quarto, S. Piazza, A. Splendore, C. Sunseri. “Oxide Films on Metals and Alloys”, p. 311, B.R. McDougall, R.S. Alwitt, T.A. Ramanarayanan, Editors, PV 92-22, The Electrochemical Society Proceeding Series, Pennington, NJ, 1992
T. Watanabe, H. Gerischer. J. Electroanal. Chem., 122 (1981) 73.
Di Quarto, G. Tuccio, A. Di Paola, S. Piazza, C. Sunseri, “Oxide Films on Metals and Alloys” p. 25, K. Hebert, G.E. Thompson, Editors, PV 94-25, The Electrochemical Society Proceeding Series, Pennington, NJ, 1994.
C. Sunseri, S. Piazza, F. Di Quarto, Mater. Sci. Forum, 185–188 (1995) 435.
F. Di Quarto, S. Piazza, C. Sunseri, M. Yang, S.M. Cai, Electrochim. Acta, 41 (1996) 2511.
S. Piazza, A. Splendore, A. Di Paola, C. Sunseri, F. Di Quarto, J. Electrochem. Soc., 140 (1993) 3146
Yu. Ya. Gurevich, Yu. V. Pleskov, Z.A. Rotenberg, Photoelectrochemistry, Plenum Press, New York, 1980.
M. Santamaria, F. Di Quarto, S. Zanna, P. Marcus, Electrochim. Acta, 53 (2007) 1314.
P. Han, D.M. Bartels, J. Phys. Chem., 94 (1990) 5824.
F. Di Quarto, C. Sunseri, S. Piazza, M.C. Romano. J. Phys. Chem. B, 101 (1997) 2519.
J.C. Phillips, Bonds and Bands in Semiconductors, Academic Press, New York, 1973.
L. Pauling, The Nature of Chemical Bond, chapter 3, Cornell University Press, Ithaca, NY, 1960.
W. Gordy, W.J.O. Thomas., J. Phys. Chem., 24 (1956) 439.
L. Allred, J. Inorg. Nucl. Chem., 17 (1961) 215.
W. Teng, J. F. Muth, U. Ozgur, M. J. Bergman, H. O. Everitt, A. K. Sharma, C. Jin, J. Narayan. Appl. Phys. Letters, 76 (2000) 979.
M. Santamaria, F. Di Quarto, P. Skeldon, G.E. Thompson, J. Electrochem. Soc., 153 (2006) B518.
M. Santamaria, D. Huerta, S. Piazza, C. Sunseri, F. Di Quarto. J. Electrochem. Soc., 147 (2000) 1366.
H. Kim, N. Hara, K. Sugimoto., J. Electrochem. Soc., 146 (1999) 955.
M. Santamaria, F. Di Quarto, H. Habazaki, Electrochim. Acta, 53 (2008) 2272.
F. Di Quarto, M. Santamaria, P. Skeldon, G.E. Thompson, Electrochim. Acta, 48 (2003) 1143
A. R. Newmark, U. Stimming, Langmuir, 3 (1987) 905.
F. Di Quarto, M.C. Romano, M. Santamaria, S. Piazza, C. Sunseri, Russian Journal of Electrochemistry, 36 (2000) 1203.
M. Santamaria, E. Adragna, F. Di Quarto, Electrochem. and Solid State Letters, 8 (2005) B12.
U. Stimming, Electrochim. Acta, 3 (1986) 415.
M. K. Carpenter, D.A. Corrigan, J. Electrochem. Soc., 136 (1989) 1022.
L. Anicai, R. Masi, M. Santamaria, F. Di Quarto, Corros. Sci,. 47 (2005) 2883.
F. Criminisi. Chem. Eng. Degree Thesis, Università di Palermo, April, 2002
Di Quarto, M. Santamaria, N. Mallandrino, V. Laget, R. Buchheit, K. Shimizu, J. Electrochem. Soc., 150 (1989) B462.
F. Di Quarto, S. Piazza, C. Sunseri, Current Topics in Electrochemistry, Vol. 3, p. 357, edited by J.C. Alexander, Council of Scientific Research Integration, Trivarandum, 1994
F. Di Quarto, S. Piazza, C. Sunseri, Mater. Sci. Forum, 192–194 (1995) 633.
L. Anicai, S. Piazza, M. Santamaria, C. Sunseri, F. Di Quarto, ATB Metallurgie, (2000) 175.
F. Di Quarto, S. Piazza, C. Sunseri, Corros. Sci., 31 (1990) 721.
H. Tsuchiya, S. Fujimoto, O. Chihara, T. Shibata, Electrochim. Acta, 47 (2002) 4357.
H. Tsuchiya, S. Fujimoto, T. Shibata, J. Electrochem. Soc., 151 (2004) B39.
S. Fujimoto, H. Tsuchiya, Corr. Science, 49 (2007) 195.
T.L. Sudesh, L. Wijesinghe, D. J. Blackwood, J. of Physics: Conference Series, 28 (2006) 74.
T.L. Sudesh, L. Wijesinghe, D. J. Blackwood, Appl. Surf. Sci., 253 (2006) 1006.
T.L. Sudesh, S.L. Wijesinghe, D. J. Blackwood, J. Electrochem. Soc., 154 (2007) C16.
T.L. Sudesh, L. Wijesinghe, D. J. Blackwood, Corros. Sci., 50 (2008) 23.
S Virtanen, P Schmuki, H. Bohni, P. Vuoristo, T. Mantyla, J. Electrochem. Soc., 142 (1995) 3067.
P. Schmuki, M. Buchler, S Virtanen, H Bohni, R. Muller, L.J. Gauchler, J. Electrochem. Soc., 142 (1995) 3336.
M. Buchler, P. Schmuki, H Bohni, T. Stenberg, T. Mantyla, J. Electrochem. Soc., 145 (1998) 378.
A.J. Davenport, L.J. Oblonsky, M.P. Ryan, M.F. Toney, J.Electrochem. Soc., 147 (2000) 2162.
S. Piazza, M. Sperandeo, C. Sunseri, F. Di Quarto, Corros. Sci., 46 (2004) 831.
C. Sunseri, S. Piazza, A. Di Paola, F. Di Quarto, J. Electrochem. Soc., 134 (1987) 2410.
G. Dagan, W-M. Shen, M. Tomkiewicz, J. Electrochem. Soc., 139 (1992) 1855.
A. Di Paola, F. Di Quarto, C. Sunseri, Corros. Sci., 26 (1986) 935.
T. D. Burleigh, R.M. Latanision. J. Electrochem. Soc., 134 (1987) 137.
A. Di Paola, D. Shukla, U. Stimming, Electrochim. Acta, 36 (1991) 345.
M.J. Kloppers, F. Bellucci, R.M. Latanision, Corrosion, 48 (1992) 229.
P. Schmuki, H. Bohni, J. Electrochem. Soc., 139 (1992) 1908.
P. Schmuki, H. Bohni, F. Mansfeld. J. Electrochem. Soc., 140 (1993) L119.
A.M.P. Simoes, M.G.S. Ferreira, B. Rondot, M. Da Cunha Belo, J. Electrochem. Soc., 137 (1990) 82.
N.E. Hakiki, M. Da Cunha Belo, A.M.P. Simoes, M.G.S. Ferreira, J. Electrochem. Soc., 145 (1998) 3821.
N.E. Hakiki, M. Da Cunha Belo, M.G.S. Ferreira, Electrochim. Acta, 44 (1999) 2473.
M.F. Montemor, M.G.S. Ferreira, N.E. Hakiki, M. Da Cunha Belo, Corros. Sci., 42 (2000) 1635.
L.J. Oblonsky, M.P. Ryan, H.S. Isaacs, J. Electrochem. Soc., 145 (1998) 1922.
P. Marcus, V. Maurice, Interfacial Electrochemistry, Ed. A. Wieckowski, M. Dekker Inc., NY, 1999, p. 541.
D. Hamm, C-O. A. Olsson, D. Landolt, Corros. Sci., 44 (2002) 1009.
Keller, H-H. Streblow, Corros. Sci., 46 (2004) 1939.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2009 Springer Science+Business Media, LLC
About this chapter
Cite this chapter
Quarto, F.D., Mantia, F.L., Santamaria, M. (2009). Physicochemical Characterization of Passive Films and Corrosion Layers by Differential Admittance and Photocurrent Spectroscopy. In: Pyun, SI., Lee, JW. (eds) Progress in Corrosion Science and Engineering I. Modern Aspects of Electrochemistry, vol 46. Springer, New York, NY. https://doi.org/10.1007/978-0-387-92263-8_4
Download citation
DOI: https://doi.org/10.1007/978-0-387-92263-8_4
Published:
Publisher Name: Springer, New York, NY
Print ISBN: 978-0-387-92262-1
Online ISBN: 978-0-387-92263-8
eBook Packages: Chemistry and Materials ScienceChemistry and Material Science (R0)