Abstract
InxGa1−x N islands grown by molecular beam epitaxy are analysed by transmission electron microscopy. Samples are compared which were of different nominal In concentrations and with or without GaN capping. The optimum imaging conditions for evaluation are described with special focus on polarity determination during analysis.
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© 2005 Springer-Verlag Berlin Heidelberg
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Pretorius, A. et al. (2005). Investigation of InxGa1−x N islands with electron microscopy. In: Cullis, A.G., Hutchison, J.L. (eds) Microscopy of Semiconducting Materials. Springer Proceedings in Physics, vol 107. Springer, Berlin, Heidelberg . https://doi.org/10.1007/3-540-31915-8_3
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DOI: https://doi.org/10.1007/3-540-31915-8_3
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-540-31914-6
Online ISBN: 978-3-540-31915-3
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