Numerical Methods for Reacting Gas Flow Simulations

  • S. van Veldhuizen
  • C. Vuik
  • C. R. Kleijn
Part of the Lecture Notes in Computer Science book series (LNCS, volume 3992)


In this study various numerical schemes for simulating 2D laminar reacting gas flows, as typically found in Chemical Vapor Deposition (CVD) reactors, are proposed and compared. These systems are generally modeled by means of many stiffly coupled elementary gas phase reactions between a large number of reactants and intermediate species. The purpose of this study is to develop robust and efficient solvers for the stiff heat-reaction system. The velocities are assumed to be given. For non-stationary CVD simulation, an optimal combination in terms of efficiency and robustness between time integration, nonlinear solvers and linear solvers has to be found. Besides stability, which is important due to the stiffness of the problem, the preservation of non-negativity of the species is crucial. It appears that this extra condition on time integration methods is much more restrictive towards the time-step than stability.


Species Equation Newton Iteration Linear Solver Chemical Vapor Deposition Process Time Integration Method 
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Copyright information

© Springer-Verlag Berlin Heidelberg 2006

Authors and Affiliations

  • S. van Veldhuizen
    • 1
  • C. Vuik
    • 1
  • C. R. Kleijn
    • 2
  1. 1.Delft Institute of Applied Mathematics and J.M. Burgers CenterDelft University of TechnologyDelftThe Netherlands
  2. 2.Department of Multi Scale Physics and J.M. Burgers CenterDelft University of TechnologyDelftThe Netherlands

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