Abstract
Carbon deposition from acetylene injection into plasma jet onto sputtered nickel on silicon is investigated. The whole methodology, including the deposition of catalyst, its etching to islands followed by the carbon growth, is implemented in the same reactor. The investigation of structure and morphology shows the formation of nickel particles coated with graphitic layers.
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References
S. I. Vizireanu, B. Mitu, and G. Dinescu, Nanostructured carbon growth by expanding rf plasma assisted CVD Ni-coated silicon substrate, Surface & Coatings Technology 200(1–4), 1132–1136 (2005).
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VIZIREANU, S., MITU, B., BIRJEGA, R., DINESCU, G., TEODORESCU, V. (2006). NANOSTRUCTURED CARBON GROWTH BY AN EXPANDING RADIOFREQUENCY PLASMA JET. In: Popov, V.N., Lambin, P. (eds) Carbon Nanotubes. NATO Science Series II: Mathematics, Physics and Chemistry, vol 222. Springer, Dordrecht. https://doi.org/10.1007/1-4020-4574-3_48
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DOI: https://doi.org/10.1007/1-4020-4574-3_48
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-4020-4572-1
Online ISBN: 978-1-4020-4574-5
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