Abstract
Using UV and X-ray photoelectron spectroscopy (UPS & XPS), we have studied the work function (WF) evolution and chemical changes of an indium-tin-oxide (ITO) surface after a series of in-situ oxygen plasma treatments (OPTs). We took special care not to damage the sample’s surface with OPT by employing the weakest possible plasma conditions. Even after such gentle OPT the WF of ITO dramatically increased up to 6.6 eV after about 300 s of OPT. The carbon contamination at the surface was completely removed after only 40 s of the gentle OPT. However, in contrast to similar studies, the compositions and the chemical states of In, Sn, and O at the ITO surface showed only minimal changes as confirmed by XPS core-level peak analyses.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
C. W. Tang and S. A. VanSlyke, Appl. Phys. Lett. 51, 913 (1987).
C. W. Tang, Appl. Phys. Lett. 48, 183 (1986).
W. B. Choi et al., Appl. Phys. Lett. 75, 3129 (1999).
D. S. Ginley and J. D. Perkins, in Handbook of Transparent Conductors (Springer, New York, 2010), p. 1.
Y. Park, V. Choong, Y. Gao, B. R. Hsieh and C. W. Tang, Appl. Phys. Lett. 68, 2699 (1996).
C. C. Wu, C. I. Wu, J. C. Sturm and A. Kahn, Appl. Phys. Lett. 70, 1348 (1997).
H. Kim, J. Lee, C. Park and Y. Park, J. Korean Phys. Soc. 41, 395 (2002).
K. Sugiyama, H. Ishii, Y. Ouchi and K. Seki, J. Appl. Phys. 87, 295 (2000).
S. Tokito, K. Noda and Y. Taga, J. Phys. D. Appl. Phys. 29, 2750 (1996).
P.-R. Huang, Y. He, C. Cao and Z.-H. Lu, NPG Asia Mater. 5, e57 (2013).
M. G. Helander, Z. B.Wang, J. Qiu, M. T. Greiner, D. P. Puzzo, Z. W. Liu and Z. H. Lu, Science 332, 944 (2011).
H. Y. Yu, X. D. Feng, D. Grozea, Z. H. Lu, R. N. S. Sodhi, A.-M. Hor and H. Aziz, Appl. Phys. Lett. 78, 2595 (2001).
I. Irfan, S. Graber, F. So and Y. Gao, Org. Electron. 13, 2028 (2012).
J.-H. Wi, J.-C. Woo and C.-I. Kim, Thin Solid Films 519, 6824 (2011).
K. He, X. Yang, H. Yan, Z. Wu, Z. Li, S. Zhong, Q. Ou and R. Liang, Org. Electron. 15, 1731 (2014).
R. Schlaf, H. Murata and Z. Kafafi, J. Electron Spectros. Relat. Phenomena 120, 149 (2001).
C. Körberet al., Phys. Rev. B 81, 165207 (2010).
C. Janowitz et al., New J. Phys. 13, 085014 (2011).
V. Christou, M. Etchells, O. Renault, P. J. Dobson, O. V. Salata, G. Beamson and R. G. Egdell, J. Appl. Phys. 88, 5180 (2000).
W. Song, S. So, D.Wang, Y. Qiu and L. Cao, Appl. Surf. Sci. 177, 158 (2001).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Maeng, M., Kim, JH., Hong, JA. et al. Effects of oxygen plasma treatments on the work function of indium tin oxide studied by in-situ photoelectron spectroscopy. Journal of the Korean Physical Society 68, 692–696 (2016). https://doi.org/10.3938/jkps.68.692
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.3938/jkps.68.692