Abstract
In order to understand quantitatively plasma phenomena and ionized gases, accurate electron collision cross-sections and electron transport coefficients for not only pure atoms and molecules but also for the binary gas mixtures are necessary. Electron transport coefficients (electron drift velocity, density-normalized longitudinal diffusion coefficient, and density-normalized effective ionization coefficient) in mixture gases of Cl2 with Ar, Xe and O2, therefore, were calculated and analyzed by using a two-term approximation of the Boltzmann equation over a wide E/N range (ratio of the electric field E to the neutral number density N). The limiting field strength values of E/N, (E/N)lim, for these binary gas mixtures were also derived and compared with those of pure SF6 gas. These binary gas mixtures are being considered for use in many industries, depending on the mixture ratio and the particular application of the gas and the electrical equipment.
Similar content being viewed by others
References
V. N. Maller and M. S. Naidu, Advances in High Voltage Insulation and Arc Interruption in SF 6 and Vacuum (Wheaton & Co. Ltd., Exeter, Great Britain, 1981).
M. H. Luly and R. G. Richard, Gaseous Dielectrics with Low Global Warming Potentials (U.S. Patent. 0320428, 2010).
Conference of the Parties, Kyoto Protocol to the United Nations Framework Convention on Climate Change (Third Session Kyoto, Kyoto, Japan, 1997).
Conference of the Parties, Kyoto Protocol to the United Nations Framework Convention on Climate Change (Third Session Kyoto, Kyoto, Japan, 1997).
M. Taki, D. Maekawa, H. Odaka, H. Mizoguchi and S. Yanabu, IEEE Trans. Dielect. and Elec. Insulation 14, 341 (2007).
H. Takagari, H. Kasuya, H. Mizoguchi and S. Yanabu, IEEE Trans. Dielect. and Elec. Insulation 15, 1424 (2008).
H. Kasuya, Y. Kawamura, H. Mizoguchi, Y. Nakamura, S. Yanabu and N. Nagasaki, IEEE Trans. Dielect. and Elec. Insulation 17, 1196 (2010).
L. G. Christophorou and R. J. Van Brunt, IEEE. Trans. Dielect. and Elec. Insulation 2, 952 (1995).
L. J. Hernández-Ávila and J. de Urquijo, J. Phys. D: Appl. Phys. 39, 647 (2006)
L. J. Hernández-Ávila, E. Basurto and J. de Urquijo, J. Phys. D: Appl. Phys. 35, 2264 (2002)
J. de Urquijo, E. Basurto and L. J. Hernández-Ávila, J. Phys. D: Appl. Phys. 34, 2151 (2001)
D. M. Xiao, L. H. Liu and Z. Y. Chen, J. Appl. Phys. 86, 6611 (1999).
D. M. Xiao, L. L. Zhu and X. G. Li, J. Phys. D: Appl. Phys. 33, L145 (2000).
Y. Qiu and D. M. Xiao, J. Phys. D: Appl. Phys. 27, 2663 (1994).
J. de Urquijo, J. L. Hernández-Ávila, E. Basurto and F. Ramírez, J. Phys. D: Appl. Phys. 36, 1489 (2003).
L. G. Christophorou, Nucl. Instr. Meth. Phys. Res. A 268, 424 (1998).
M. Roberto, Proceedings of the 1998 ICPP & 25th EPS Conference on Plasma Physics and Controlled Fusion (Prague, Czech Republic, June 29–July 3); Europhysics Conference Abstracts 22C, 2698-1 (1998).
E. G. Thorsteinsson and J. T. Gudmundsson, Plasma Sources Sci. Technol. 19, 055008-1 (2010).
J. T. Gudmundsson, A. T. Hjartarson and E. G. Thorsteinsson, Vacuum 86, 808 (2012).
A. M. Efremov, G. H. Kim, J. G. Kim, A. V. Bogomolov and C. I. Kim, Microelectron Eng. 84, 136 (2007).
N. H. Malik and A. H. Qureshi, IEEE Trans. Elec. Insulation EI-15, 413 (1980).
R. S. Taylor and K. E. Leopold, IEEE J. Quantum Electron. 31, 2195 (1995).
Y. C. Lin, S. J. Chang, Y. K. Su, S. C. Shei and S. J. Hsu, Mat. Sci. Eng. B-Solid 98, 60 (2003).
R. E. Robson, Aust. J. Phys. 37, 35 (1984).
B. H. Jeon, J. Korean Phys. Soc. 43, 513 (2003).
B. H. Jeon, J. Korean Phys. Soc. 49, 2321 (2006).
M. Kimura and Y. Nakamura, J. Phys. D: Appl. Phys. 43, 145202-1 (2010).
Y. Nakamura, J. Phys. D: Appl. Phys. 43, 365201-1 (2010).
D. A. Tuan and B. H. Jeon, J. Phys. Soc. Jpn. 80, 084301-1 (2011).
L. G. H. Huxley and R. W. Crompton, The Diffusion and Drift of Electrons in Gases (New York: John Wiley & Sons, New York, 1974), Chaps. 6 and 13.
L. G. Christophorou and S. R. Hunter, Electron-Molecule Interations and Their Applications, vol 2, edited by L. G. Christophorou (Academic Press, Florida, 1984), pp. 318–412.
Y. Nakamura and M. Kurachi, J. Phys. D: Appl. Phys. 21, 718 (1988).
T. Hashimoto and Y. Nakamura, Papers of Gas Discharge Technical Committee, ED-90-61 (IEE Japan) (1990). As quoted in M. Suzuki, T. Taniguchi, N. Yoshimura and H. Tagashira H. J. Phys. D: Appl. Phys. 25, 50 (1992)
V. A. Bailey and R. H. Healey, Philos. Mag. 19, 725 (1935).
S. E. Božin and C. C. Goodyear, Br. J. Appl. Phys. 18, 49 (1967).
J. Dutton, J. Phys. Chem. Ref. Data 4, 577 (1975).
A. A. Kruithof, Physica 7, 519 (1940) as quoted in Ref. 35.
M. Yousfi, J. de Urquijo, A. Juárez, E. Basurto and J. L. Hernández-Ávila, IEEE Trans. Plasma Sci. 37, 764 (2009).
H. Tagashira, Y. Sakai and S. Sakamoto, J. Phys. D: Appl. Phys. 10, 1051 (1977).
D. A. Tuan and B. H. Jeon, J. Phys. Soc. Jpn. 81, 064301-1 (2012).
R. V. Chiflikian, Phys. Plasmas 2, 3902 (1995).
T. Aschwanden, Die Ermittlung physikalischer entladungsparameter in isoliergasen und isoliergasgemischen mit einer verbesserten swarm-methode, PhD dissertation (Eidgenössische Technische Hochschule Zürich, Zurich, 1985). From Ref. 26.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Tuan, D.A. Calculations of electron transport coefficients in Cl2-Ar, Cl2-Xe and Cl2-O2 mixtures. Journal of the Korean Physical Society 64, 23–29 (2014). https://doi.org/10.3938/jkps.64.23
Received:
Published:
Issue Date:
DOI: https://doi.org/10.3938/jkps.64.23