Abstract
The effect of the mixture was analyzed on the electrophysical parameters and emission spectra of CF2Cl2/Ar and CF2Cl2/He plasma. Data on the gas temperature and reduced electric field intensity are obtained. Based on the analysis of the plasma emission spectra, it is suggested that the dilution of CF2Cl2 with argon or helium, even in a 1-to-1 ratio, does not cause significant changes in the concentration of Cl atoms.
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References
VLSI Electronics. Plasma Processing for VLSI, Einspruch, N.G. and Brown, D.M., Eds., New York: Academic, 1984, Vol. 8.
Murin, D.B., Efremov, A.M., Svettsov, V.I., Pivovarenok, S.A., Ovtsyn, A.A., and Shabadarov, S.S., Radiation intensities and concentrations of active species in glow discharge plasma in mixtures of hydrogen chloride with argon and helium, Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol., 2013, vol. 56, no. 4, pp. 29–32.
Lakdawala, V.K., Ko, S.T., and Albin, S., Bull. Am. Phys. Soc., 1988, vol. 33, p. 145.
Efremov, A.M., Pivovarenok, S.A., and Svettsov, V.I., Kinetics and mechanisms of Cl2 or HCl plasma etching of copper, Russ. Microelectron., 2007, vol. 36, no. 6, pp. 358–365.
Rokhlin, G.N., Gazorazryadnye istochniki sveta (Gas Discharge Light Sources), Moscow: Energiya, 1966.
Pearse, R.W.B. and Gaydon, A.G., The Identification of Molecular Spectra, New York: Wiley, 1976. 4th ed.
Striganov, A.R. and Sventitskii, N.S., Tablitsy spektral’nykh linii neitral’nykh i ionizirovannykh atomov (Tables of Spectral Lines of Neutral and Ionized Atoms), Moscow: Atomizdat, 1966.
Efremov, A.M., Pivovarenok, S.A., and Svettsov, V.I., Plasma parameters and etching mechanisms of metals and semiconductors in hydrogen chloride, Russ. Microelectron., 2009, vol. 38, no. 3, pp. 147–159.
Pivovarenok, S.A., Dunaev, A.V., Murin, D.B., Efremov, A.M., and Svettsov, V.I., Electrophysical parameters and emission spectra of glow discharge in HCl, Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol., 2011, vol. 54, no. 9, pp. 48–52.
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Original Russian Text © S.A. Pivovarenok, 2017, published in Mikroelektronika, 2017, Vol. 46, No. 4.
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Pivovarenok, S.A. Effect of the mixture composition on the electrophysical parameters and emission spectra of CF2Cl2/Ar and CF2Cl2/He plasma. Russ Microelectron 46, 267–271 (2017). https://doi.org/10.1134/S1063739717040072
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DOI: https://doi.org/10.1134/S1063739717040072