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Effect of the mixture composition on the electrophysical parameters and emission spectra of CF2Cl2/Ar and CF2Cl2/He plasma

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Abstract

The effect of the mixture was analyzed on the electrophysical parameters and emission spectra of CF2Cl2/Ar and CF2Cl2/He plasma. Data on the gas temperature and reduced electric field intensity are obtained. Based on the analysis of the plasma emission spectra, it is suggested that the dilution of CF2Cl2 with argon or helium, even in a 1-to-1 ratio, does not cause significant changes in the concentration of Cl atoms.

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References

  1. VLSI Electronics. Plasma Processing for VLSI, Einspruch, N.G. and Brown, D.M., Eds., New York: Academic, 1984, Vol. 8.

  2. Murin, D.B., Efremov, A.M., Svettsov, V.I., Pivovarenok, S.A., Ovtsyn, A.A., and Shabadarov, S.S., Radiation intensities and concentrations of active species in glow discharge plasma in mixtures of hydrogen chloride with argon and helium, Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol., 2013, vol. 56, no. 4, pp. 29–32.

    Google Scholar 

  3. Lakdawala, V.K., Ko, S.T., and Albin, S., Bull. Am. Phys. Soc., 1988, vol. 33, p. 145.

    Google Scholar 

  4. Efremov, A.M., Pivovarenok, S.A., and Svettsov, V.I., Kinetics and mechanisms of Cl2 or HCl plasma etching of copper, Russ. Microelectron., 2007, vol. 36, no. 6, pp. 358–365.

    Article  Google Scholar 

  5. Rokhlin, G.N., Gazorazryadnye istochniki sveta (Gas Discharge Light Sources), Moscow: Energiya, 1966.

    Google Scholar 

  6. Pearse, R.W.B. and Gaydon, A.G., The Identification of Molecular Spectra, New York: Wiley, 1976. 4th ed.

    Book  Google Scholar 

  7. Striganov, A.R. and Sventitskii, N.S., Tablitsy spektral’nykh linii neitral’nykh i ionizirovannykh atomov (Tables of Spectral Lines of Neutral and Ionized Atoms), Moscow: Atomizdat, 1966.

    Google Scholar 

  8. Efremov, A.M., Pivovarenok, S.A., and Svettsov, V.I., Plasma parameters and etching mechanisms of metals and semiconductors in hydrogen chloride, Russ. Microelectron., 2009, vol. 38, no. 3, pp. 147–159.

    Article  Google Scholar 

  9. Pivovarenok, S.A., Dunaev, A.V., Murin, D.B., Efremov, A.M., and Svettsov, V.I., Electrophysical parameters and emission spectra of glow discharge in HCl, Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol., 2011, vol. 54, no. 9, pp. 48–52.

    Google Scholar 

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Correspondence to S. A. Pivovarenok.

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Original Russian Text © S.A. Pivovarenok, 2017, published in Mikroelektronika, 2017, Vol. 46, No. 4.

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Pivovarenok, S.A. Effect of the mixture composition on the electrophysical parameters and emission spectra of CF2Cl2/Ar and CF2Cl2/He plasma. Russ Microelectron 46, 267–271 (2017). https://doi.org/10.1134/S1063739717040072

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  • DOI: https://doi.org/10.1134/S1063739717040072

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