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Comparative study of the morphological degradation in nickel thin films exposed to H2S media and deposited by magnetron sputtering and electrolytic process

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Abstract

Nickel thin films with regular configuration and similar thickness were deposited on steel AISI 1018 (UNSG 10180) by two different techniques: magnetron sputtering and electrolytic process. The main aim of this work is to compare the surfaces deposited films made by the two techniques using the scanning electronic microscopy and to identify their morphological differences and imperfections. We evaluate the protective coatings properties when the films are in contact with an acid medium. We also study the thin films coatings by the spectroscopy impedance technique. We obtain that the sputtering deposits present a homogeneous thin film coating that is better than the one obtained by the electrolytic technique. It is expected that the thin film coatings made in this work can protect the steel against corrosion when it is in contact with an acid environment.

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Authors and Affiliations

  1. Instituto de Física, Universidad Nacional Autónoma de México, Ap. Postal 20-364, México, D.F., 01000, México

    C. Magaña-Zavala, D. R. Acosta & A. López-Suárez

  2. División de Estudios de Posgrado e Investigación, Departamento de Polímeros, Institute Tecnológico de Cd. Madero, Tamaulipas, Mexico

    M. E. Angeles-San Martin

  3. Departamento de Ingeniería Metalúrgica, Facultad de Química, Universidad National Autónoma de México, 04510, México D. F., México

    F. J. Rodríguez-Gómez

  4. Universidad de los Andes. Mérida Venezuela, Merida, Venezuela

    R. Avila-Godoy

Authors
  1. C. Magaña-Zavala
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  2. M. E. Angeles-San Martin
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  3. F. J. Rodríguez-Gómez
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  4. D. R. Acosta
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  5. R. Avila-Godoy
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  6. A. López-Suárez
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Correspondence to C. Magaña-Zavala.

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Magaña-Zavala, C., Angeles-San Martin, M.E., Rodríguez-Gómez, F.J. et al. Comparative study of the morphological degradation in nickel thin films exposed to H2S media and deposited by magnetron sputtering and electrolytic process. Surf. Engin. Appl.Electrochem. 46, 115–119 (2010). https://doi.org/10.3103/S1068375510020055

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  • DOI: https://doi.org/10.3103/S1068375510020055

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