Skip to main content
SpringerLink
Log in

Optical and Soft X-ray Microlithography at the Turn of the Century

  • Published:
Bulletin of the Lebedev Physics Institute Aims and scope Submit manuscript

Abstract

A review is presented of the development of methods of industrial excimer laser photolithography and soft X-ray projection lithography at the end of the 20th century and the beginning of the 21st century. The contribution of N.G. Basov and his colleagues at FIAN and MEPhI to the development of this direction is revealed.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

Notes

  1. According to the outstanding Soviet scientist K.A. Valiev, “microlithography is a set of methods of pattern formation in layers of integrated circuits, and it can be considered the key one in all microelectronic technology” [4].

  2. Corresponding FIAN Preprint No. 104 was published earlier in 1987.

  3. In Russian scientific literature, the term “deep ultraviolet lithography” is sometimes used, which is not entirely correct, because it coincides with the English DUV lithography, i.e., deep ultraviolet.

REFERENCES

  1. Veiko, V.P., Lazernye mikro- i nanotekhnologii v mikroelektronike (Laser Micro- And Nanotechnologies in Microelectronics), St. Petersburg: NIU ITMO, 2011.

  2. Valiev, K.A. and Rakov, A.V., Fizicheskie osnovy submikronnoy litografii v mikroelektronike (Physical Foundations of Submicron Lithography in Microelectronics), Moscow: Radio i svyaz’, 1984).

  3. Lojek, B., History of Semiconductor Engineering, Berlin: Springer, 2007.

    Google Scholar 

  4. Moreau, W., Semiconductor Litography, New York: Wiley, 1988.

    Book  Google Scholar 

  5. Hu, X., Proc. 2015 International Power, Electronics and Materials Engineering Conference, Dordrecht: Atlantis Press, 2015, p. 843.

  6. Kapoor, R. and Adner, R., Solid State Technol., 2007, vol. 11, p. 51.

    Google Scholar 

  7. Berger, S.D., Gibson, J.M., Camarda, R.M., Farrow, R.C., Huggins, H.A., Kraus, J.S., and Liddle, J.A., J. Vac. Sci. Technol. B, 1991, vol. 9, p. 2996.

    Article  Google Scholar 

  8. Melngailis, J., Mondelli, A.A., Berry, I.L., and Mohondro, R., J. Vac. Sci. Technol. B, 1998, vol. 16, p. 927.

    Article  Google Scholar 

  9. Chou, S.Y., Krauss, P.R., and Renstrom, P.J., J. Vac. Sci. Technol. B, 1996, vol. 14, p. 4129.

    Article  Google Scholar 

  10. Peckerar, M.C. and Maldonado, J.R., Proc. IEEE, 1993, vol. 81, p. 1249.

    Article  Google Scholar 

  11. Levi, B.G., Phys. Today, 1991, vol. 44, p. 17.

    ADS  Google Scholar 

  12. Spiller, E., Appl. Phys. Lett., 1972, vol. 20, p. 365.

    Article  ADS  Google Scholar 

  13. Vinogradov, A.V. and Zeldovich, B.Y., Appl. Opt., 1977, vol. 16, p. 89.

    Article  ADS  Google Scholar 

  14. Bharti, A., Turchet, A., and Marmiroli, B., Front. Nanotechnol., 2022, vol. 4, p. 835701.

  15. Pang, L., J. Micro/Nanopattern. Mater. Metrol., 2021, vol. 20, p. 030901.

  16. Bakshi, V., EUV Lithography, Bellingham: SPIE Press, 2008.

    Book  Google Scholar 

  17. Kinoshita, H., Kaneko, T., Takei, H., Takeuchi, N., and Ishihara, S., Proc. 47th Autumn Meeting of the Japan Society of Applied Physics, 1986, paper 28-ZF-15.

  18. Lai, B., Cerrina, F., and Underwood, J.H., Proc. SPIE, 1985, vol. 563, p. 174.

    Article  ADS  Google Scholar 

  19. Vinogradov, A.V. and Zorev, N.N., Dokl. Akad. Nauk SSSR, 1988, vol. 302, p. 82.

    Google Scholar 

  20. Artyukov, I.A., Balakireva, L.L., Bijkerk, F., Vinogradov, A.V., Zorev, N.N., Kozhevnikov, I.V., Kondratenko, V.V., Ogurtsov, O.F., Ponomarenko, A.G., and Fedorenko, A.I., Sov. J. Quantum Electron., 1992, vol. 22, p. 99.

    Article  ADS  Google Scholar 

  21. Artioukov, I.A. and Vinogradov, A.V., Proc. SPIE, 1992, vol. 1551, p. 161.

    Article  ADS  Google Scholar 

  22. Artyukov I.A., Extended Abstract of Cand. Sci. Dissertation, Moscow: Fiz. Inst. Akad. Nauk, 1992.

  23. Artyukov, I.A., Fedorenko, A.I., Kondratenko, V.V., Yulin, S.A., and Vinogradov, A.V., Opt. Commun., 1993, vol. 102, p. 401.

    Article  ADS  Google Scholar 

  24. Artyukov, I.A., Vinogradov, A.V., Kondratenko, V.V., Fedorenko, A.I., and Yulin, S.A., Russ. Microelectron., 1996, vol. 25, p. 48.

    Google Scholar 

  25. Artyukov, I.A., Asadchikov, V.E., Vinogradov, A.V., Kasyanov, Yu.S., Kondratenko, V.V., Serov, R.V., Fedorenko, A.I., Yulin, S.A., and Ishchenko, N.V., RF Patent 2122757 C1, 1996.

  26. Artyukov, I.A., Otchet o NIR N 95-02-04908 (Research Report no. 95-02-04908), Moscow: Ross. Fond Funfam. Issled., 1996.

  27. Lange, K., Müller-Seitz, G., Sydow, J., and Windeler, A., Res. Policy, 2013, vol. 42, p. 647.

    Article  Google Scholar 

  28. Koshelev, K.N., Banin, V.E., and Salashchenko, N.N., Phys. Usp., 2007, vol. 50, p. 741.

    ADS  Google Scholar 

  29. Gomes, W., Koker, A., Stover, P., Ingerly, D., Siers, S., Venkataraman, S., Pelto, C., Shah, T., Rao, A., O’Mahony, F., Karl, E., Cheney, L., Rajwani, I., Jain, H., Cortez, R., Chandrasekhar, A., Kanthi B., and Koduri, R., Proc. 2022 IEEE International Solid State Circuits Conference (ISSCC), IEEE, 2022, p. 42.

  30. Gus’kov, S.Yu., Quantum Electron., 2022, vol. 52, p. 1070.

    Google Scholar 

  31. Basov, N.G., IEEE J. Quantum Electron., 1966, vol. 354, p. QE-2.

    Google Scholar 

  32. Basov, N.G., Balashov, E.M., Bogdankevitch, O.V., Danilychev, V.A., Kashnikov, G.N., Lantzov, N.P., and Khodkevitch, D.D., J. Lumin., 1970, vol. 1, p. 834.

    Article  Google Scholar 

  33. Basov, N.G., Bogdankevich, O.V., Danilychev, V.A., Kashnikov, G.N., Kerimov, O.M., and Lantsov, N.P., Kr. Soobshch. Fiz. FIAN, 1970, vol. 7, p. 68.

    Google Scholar 

  34. Basov N.G., Danilychev V.A., Popov Yu.M., and Khodkevich D.D., JETF Lett., 1970, vol. 12, p. 329.

    ADS  Google Scholar 

  35. Anan’in, O.B., Bykovskii, Yu.A., Kantsyrev, V.L., and Kozyrev, Yu.P., Author’s Certificate SU 520 863 A1, 1974.

  36. Bykovskii, Yu.A., Dudoladov, A.G., and Kozlenkov, V.P., Author’s Certificate SU 646 578 A1, 1974.

  37. Anan’in, O.B., Bykovskii, Yu.A., Kantsyrev, V.L., and Raspopin, A.M., Sov. J. Quantum Electron., 1977, vol. 7, p. 541.

    Article  ADS  Google Scholar 

  38. Bykovskii, Yu.A., Kantsyrev, V.L., Kaplun, Z.F., Kozyrev, Yu.P., Pikula, N.K., Rabodzei, N.V., and Reshetnikov, A.M., Elektron. Tekh. Ser. 1. Elektron. SVCh, 1979, vol. 1, p. 84.

    Google Scholar 

  39. Basov, N.G., Bykovskii, Yu.A., Vinogradov, A.V., Galichii, A.A., Kalashnikov, M.P., Kantsyrev, V.L., Kozyrev, Yu.P., Mazur, M.Yu., Mikhailov, Yu.A., Puzyrev, V.P., Rode, A.V., Sklizkov, G.V., and Frondzei, I.Ya., Sov. J. Quantum Electron., 1982, vol. 12, p. 977.

    Article  ADS  Google Scholar 

  40. Boiko, V.A., Vinogradov, A.V., Pikuz, S.A., Skobelev, I.Yu., and Faenov, A.Ya., Rentgenovskaya spektroskopiya lazernoy plazmy (X-Ray Spectroscopy of Laser Plasma), Moscow: VINITI, 1980.

  41. Basov, N.G., Zakarenkov, Yu.A., Rupasov, A.A., Sklizkov, G.V., and Shikanov, A.S., Diagnostika plotnoy plazmy (Dense Plasma Diagnostics), Moscow: Nauka, 1989.

  42. Bogdanov, A.L., Valiev, K.A., Velikov, L.V., Zaroslov, D.Yu., Zakharov, A.P., and Prokhorov, A.M., Sov. J. Quantum Electron., 1985, vol. 15, p. 1654.

    Article  ADS  Google Scholar 

  43. Aleksandrov, Yu., Valiev, K., Velikov, L., Glebova, O., Gribov, B., Dushenkov, S., and Pleshivtsev, A., Mikroelektronika, 1983, vol. 12, p. 3.

    Google Scholar 

  44. Avtonomov, V.P., Geonjian, Yu.G., Orlov, A.V., Slizkov, G.V., Subbotin, L.K., and Checkmarev, A.M., Microelectron. Eng., 1985, vol. 3, p. 623.

    Article  Google Scholar 

  45. Arapova, E.Ya., Isaev, A.A., Kazaryan, M.A., Markova, S.V., Petrash, G.G., Timofeev, Yu.P., and Fridman, S.A., Sov. J. Quantum Electron., 1975, vol. 5, p. 849.

    Article  ADS  Google Scholar 

  46. Zemskov, K.I., Kazaryan, M.A., Petrash, G.G., Smorchkov, V.N., Timofeev, Yu.P., and Fridman, S.A., Sov. J. Quantum Electron., 1980, vol. 10, p. 1428.

    Article  ADS  Google Scholar 

  47. Artioukov, I.A., Vinogradov, A.V., Asadchikov, V.E., Kas’yanov, Y.S., Serov, R.V., Fedorenko, A.I., Kondratenko, V.V., and Yulin, S.A., Opt. Lett., 1995, vol. 20, p. 2451.

    Article  ADS  Google Scholar 

Download references

ACKNOWLEDGMETS

The author is grateful to A.Yu. Bykovskii, A.V. Vinogradov, V.D. Zvorykin, R.M. Feshchenko, A.A. Rupasov, A.M. Chekmarev, and V.A. Chirkov for valuable consultations.

Author information

Authors and Affiliations

  1. Lebedev Physical Institute, Russian Academy of Sciences, 119991, Moscow, Russia

    I. A. Artyukov

Authors
  1. I. A. Artyukov
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to I. A. Artyukov.

Additional information

Translated by I. Ulitkin

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Artyukov, I.A. Optical and Soft X-ray Microlithography at the Turn of the Century. Bull. Lebedev Phys. Inst. 50 (Suppl 4), S426–S434 (2023). https://doi.org/10.3103/S1068335623160029

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.3103/S1068335623160029

Keywords:

Search

Navigation