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Characterization of DC magnetron sputtering deposited thin films of TiN for SBN/MgO/TiN/Si structural waveguide

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Abstract

Optimal parameters for depositing Titanium nitride (TiN) thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si (100) substrates by DC reactive magnetron sputtering, at different temperatures, different electrical current values, and different N2/Ar ratios. Structural characteristics of TiN thin films were measured by X-ray diffraction (XRD); surface morphology of the thin films was characterized using an atomic force microscope (AFM). The electric resistivity of the TiN films was measured by a four-point probe. In the result, temperature is 500 °C, electrical current value is 1.6 A, pure N2 is the reacting gas, TiN thin film has the preferred (200) orientation, resistance is small enough for its use as bottom electrodes.

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Authors and Affiliations

  1. State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou, 310027, China

    Xu Xuan-qian  (徐玄前), Ye Hui  (叶辉) & Zou Tong  (邹桐)

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  1. Xu Xuan-qian  (徐玄前)
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  2. Ye Hui  (叶辉)
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  3. Zou Tong  (邹桐)
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Corresponding author

Correspondence to Ye Hui  (叶辉).

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Project supported by the National Natural Science Foundation of China (No. 60478039) and the Natural Science Foundation of Zhejiang Province (No. X405002), China

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Xu, Xq., Ye, H. & Zou, T. Characterization of DC magnetron sputtering deposited thin films of TiN for SBN/MgO/TiN/Si structural waveguide. J. Zhejiang Univ. - Sci. A 7, 472–476 (2006). https://doi.org/10.1631/jzus.2006.A0472

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  • DOI: https://doi.org/10.1631/jzus.2006.A0472

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